Method for effective BiCMOS process integration
View Patent ↗According to an exemplary embodiment, a method for integrating bipolar and CMOS devices on a substrate, where the substrate includes bipolar and CMOS regions and has a sacrificial oxide layer situated thereon, includes removing a portion of the sacrificial oxide layer in the bipolar region of the substrate to expose a top surface of the substrate. The method includes forming a base layer on the top surface of the substrate in the bipolar region. The base layer forms a bipolar transistor base. The method further includes forming a sacrificial post on the base layer in the bipolar region and at least one gate electrode in the CMOS region of the substrate. A common mask is used to form the sacrificial post and the at least one gate electrode. The method further includes forming LDD regions adjacent to the at least one gate electrode in the CMOS region.
1. A method for integrating bipolar and CMOS devices on a substrate, said substrate including a bipolar region and a CMOS region, said substrate having a sacrificial oxide layer situated thereon, said method comprising steps of:
removing a portion of said sacrificial oxide layer in said bipolar region of said substrate to expose a top surface of said substrate;
forming a base layer on said top surface of said substrate in said bipolar region;
forming a sacrificial post on said base layer in said bipolar region and at least one gate electrode in said CMOS region of said substrate;
wherein said base layer forms a bipolar transistor base, and wherein said base layer is formed prior to formation of said at least one gate electrode in said CMOS region of said substrate.
2. The method of claim 1 wherein said step of forming said sacrificial post comprises using a common mask to form said sacrificial post and said at least one gate electrode.
3. The method of claim 1 wherein said base layer comprises epitaxial silicon-germanium.
4. The method of claim 1 further comprising a step of forming LDD regions adjacent to said at least one gate electrode in said CMOS region.
5. The method of claim 1 further comprising a step of forming spacers adjacent to said sacrificial post in said bipolar region and adjacent to said at least one gate electrode in said CMOS region.
6. The method of claim 5 further comprising a step of forming source/drain regions adjacent to said at least one gate electrode in said CMOS region.
7. The method of claim 6 further comprising steps of:
removing said sacrificial post to form an emitter window opening;
forming an emitter in said emitter window opening.
8. The method of claim 1 further comprising a step of growing a dielectric layer in said bipolar region and said CMOS region prior to said step of forming said sacrificial post, wherein said dielectric layer forms a gate dielectric in said CMOS region.
9. The method of claim 1 wherein said base layer comprises epitaxial silicon-germanium-carbon.
10. The method of claim 1 wherein said bipolar transistor base is a self-aligned NPN transistor base.
11. A method for integrating bipolar and CMOS devices on a substrate, said substrate including a bipolar region and a CMOS region, said substrate having a sacrificial oxide layer situated thereon, said method comprising steps of:
removing a portion of said sacrificial oxide layer in said bipolar region of said substrate to expose a top surface of said substrate;
forming a base layer on said top surface of said substrate in said bipolar region;
forming a sacrificial post on said base layer in said bipolar region and an NFET gate electrode and a PFET gate electrode in said CMOS region of said substrate;
wherein said step of forming said sacrificial post comprises using a common mask to form said sacrificial post and at least one gate electrode in a CMOS region of said substrate, and wherein said base layer is formed prior to formation of said at least one gate electrode in said CMOS region of said substrate.
12. The method of claim 11 wherein said base layer is an NPN transistor base.
13. The method of claim 11 wherein said base layer comprises epitaxial silicon-germanium.
14. The method of claim 11 wherein said base layer comprises epitaxial silicon-germanium-carbon.
15. The method of claim 1 further comprising a step of forming extrinsic base regions adjacent to said sacrificial post in said bipolar region and P type LDD regions adjacent to said PFET gate electrode in said CMOS region.
16. The method of claim 15 further comprising a step of forming N type LDD regions adjacent to said NFET gate electrode in said CMOS region.
17. The method of claim 11 further comprising a step of forming spacers adjacent to said sacrificial post in said bipolar region and adjacent to said NFET gate electrode and said PFET gate electrode in said CMOS region.
18. The method of claim 17 further comprising steps of:
removing said sacrificial post to form an emitter window opening;
forming an emitter in said emitter window opening.
19. The method of claim 11 further comprising a step of growing a dielectric layer in said bipolar region and said CMOS region prior to said step of forming said sacrificial post, wherein said dielectric layer forms a gate dielectric in said CMOS region.
20. The method of claim 11 wherein said common mask is a phase shift mask.