IP Library Granted Patent US 7,195,952
Granted Patent B2
US 7,195,952 · App. 11/087,913 · Granted Mar 27, 2007

Schottky diode device with aluminum pickup of backside cathode

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Quick Facts
Patent No.
US 7,195,952
App. No.
11/087,913
Granted
Mar 27, 2007
Kind
B2
Abstract

An integrated circuit package includes a semiconductor chip having a passivation layer forming the top surface of the semiconductor chip and a metal pad formed on the passivation layer and a discrete electronic device having a first terminal formed on a first surface and a second terminal formed on a second surface opposite the first surface of the discrete electronic device where the first surface of the discrete electronic device is attached to the metal pad using a conductive adhesive structure. The semiconductor chip and the discrete electronic device are encapsulated in an encapsulation material. An electrical connection is formed between the metal pad and one of a bond pad of the semiconductor chip or a package post of the integrated circuit package. In one embodiment, the metal pad is an aluminum pad and a metal line connects the metal pad to a bond pad of the semiconductor chip.

Claims (22)

1. A method for forming an integrated circuit package including a semiconductor chip having a passivation layer and a discrete electronic device, the method comprising:

providing a discrete electronic device having a first surface and a second surface opposite the first surface, the first surface comprising a single terminal being a backside electrode of the discrete electronic device, and the second surface comprises a second terminal, at least one of the backside electrode and the second terminal of the discrete electronic device being electronically coupled to the semiconductor chip;

forming a metal pad on the top surface of the passivation layer of the semiconductor chip;

attaching substantially the entire first surface of the discrete electronic device to the metal pad using a conductive adhesive structure to form an electrical connection between the backside electrode of the discrete electronic device and the metal pad;

forming an electrical connection from the metal pad to one of a bond pad of the semiconductor chip or a package post of the integrated circuit package; and

encapsulating the semiconductor chip and the discrete electronic device to form the integrated circuit package.

2. The method of claim 1 , wherein forming an electrical connection from the metal pad to one of a bond pad of the semiconductor chip or a package post of the integrated circuit package comprises forming an electrical connection from the metal pad to a first bond pad of the semiconductor chip.

3. The method of claim 2 , wherein forming an electrical connection from the metal pad to a first bond pad of the semiconductor chip comprises:

forming a metal line on the top surface of the passivation layer of the semiconductor chip, the metal line connecting the metal pad to the first bond pad.

4. The method of claim 3 , wherein the first bond pad connects to circuitry of the semiconductor chip.

5. The method of claim 1 , wherein forming an electrical connection from the metal pad to one of a bond pad of the semiconductor chip or a package post of the integrated circuit package comprises forming an electrical connection from the metal pad to a first package post of the integrated circuit package.

6. The method of claim 5 , wherein forming an electrical connection from the metal pad to a first package post of the integrated circuit package comprises:

connecting the metal pad to the first package post using a bond wire.

7. The method of claim 1 , further comprising:

forming a second electrical connection using a bond wire from the second terminal on the second surface of the discrete electronic device to one of a bond pad of the semiconductor chip or a package post of the integrated circuit package.

8. The method of claim 1 , wherein the metal pad comprises an aluminum pad.

9. The method of claim 1 , wherein the conductive adhesive structure comprises a conductive epoxy.

10. The method of claim 9 , wherein the conductive adhesive structure comprises a gold layer formed on the first surface of the discrete electronic device and a conductive epoxy layer formed on the gold layer for attaching to the metal pad.

11. The method of claim 10 , wherein the gold layer is doped with 0.1% arsenic.

12. The method of claim 1 wherein the discrete electronic device comprises one of a Schottky diode, a VDMOS device, an NPN transistor and a PNP transistor.

13. The method of claim 1 , further comprising:

prior to attaching the first surface of the discrete electronic device to the metal pad, roughening the first surface of the discrete electronic device using a coarse wheel grinder.

Assignments (9)
INTELLECTUAL PROPERTY BUY-IN AGREEMENT/ASSIGNMENT Recorded Apr 4, 2023
From: MICREL LLC
To: MICROCHIP TECHNOLOGY INCORPORATED
Reel/Frame 063241/0771 →
RELEASE OF SECURITY INTEREST Recorded Mar 14, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 060894/0437 →
RELEASE OF SECURITY INTEREST Recorded Mar 11, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059363/0001 →
RELEASE OF SECURITY INTEREST Recorded Mar 10, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059863/0400 →
SECURITY INTEREST Recorded Jun 4, 2021
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 057935/0474 →
SECURITY INTEREST Recorded Dec 24, 2020
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 055671/0612 →
SECURITY INTEREST Recorded Jun 5, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION
Reel/Frame 053468/0705 →
RELEASE OF SECURITY INTEREST Recorded May 30, 2020
From: JPMORGAN CHASE BANK, N.A, AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 053466/0011 →
SECURITY INTEREST Recorded Apr 24, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 053311/0305 →