Transistor having multiple channels
View Patent ↗A transistor ( 10 ) overlies a substrate ( 12 ) and has a plurality of overlying channels ( 72, 74, 76 ) that are formed in a stacked arrangement. A continuous gate ( 60 ) material surrounds each of the channels. Each of the channels is coupled to source and drain electrodes (S/D) to provide increased channel surface area in a same area that a single channel structure is conventionally implemented. A vertical channel dimension between two regions of the gate ( 60 ) are controlled by a growth process as opposed to lithographical or spacer formation techniques. The gate is adjacent all sides of the multiple overlying channels. Each channel is formed by growth from a common seed layer and the source and drain electrodes and the channels are formed of a substantially homogenous crystal lattice.
1. A transistor overlying a substrate, the transistor comprising:
a first current handling terminal;
a second current handling terminal;
a plurality of channels overlying the substrate, at least two of which are of differing thickness, wherein each of the plurality of channels are electrically coupled to the first current handling terminal and the second current handling terminal, and wherein at least one of the plurality of channels overlies another one of the plurality of channels, wherein the first current handling terminal is comprised of a first substantially homogenous crystal lattice, the second current handling terminal is comprised of a second substantially homogenous crystal lattice, and the plurality of channels is comprised of a third substantially homogenous crystal lattice; and
a control terminal proximate to the plurality of channels for modulating the plurality of channels through a dielectric.
2. The transistor of claim 1 wherein the control terminal is shaped to fully loop around at least one channel.
3. The transistor of claim 2 wherein the plurality of channels form a vertical stack.
4. The transistor of claim 1 wherein at least two of the plurality of channels are separated from an adjacent channel by a different amount.
5. The transistor of claim 1 wherein the plurality of channels form a vertical stack.
6. The transistor of claim 1 wherein each of the first and second current handling terminals have a width substantially equal to a first value and each of the plurality of channels has a width substantially equal to a second value, wherein the first value is greater than the second value.
7. The transistor of claim 1 wherein the plurality of channels are physically separated at least by portions of a control terminal material.
8. An integrated circuit comprising:
a substrate; and
a transistor overlying the substrate, the transistor comprising:
a first channel of a first thickness overlying the substrate;
a first portion of a gate electrode overlying the first channel;
a second channel of a second thickness that differs from the first thickness, the second channel overlying the first portion of the gate electrode;
a second portion of the gate electrode overlying the second channel and connecting to the first portion of the gate electrode;
a first current handling electrode connected to the first channel and the second channel; and
a second current handling electrode connected to the first channel and the second channel.
9. The transistor of claim 8 wherein each of the first current handling electrode and the second current handling electrode has a minimum width that is greater than a maximum width of each of the first channel and the second channel.
10. The transistor of claim 8 further comprising:
a gate dielectric material disposed between each of the first channel and the second channel and the gate electrode.
11. The transistor of claim 8 wherein the first portion of the gate electrode is connected to the second portion of the gate electrode to form a loop around the second channel.
12. A vertical multiple-channel FET device comprising:
an integrated circuit substrate;
at least two layers of a first composition having a first etch property;
at least one layer of a second composition having a second etch property, wherein the at least two layers of the first composition and the at least one layer of the second composition have a substantially homogenous crystallinity and wherein the at least two layers of the first composition are separated by the at least one layer of the second composition;
a blocking layer over the at least two layers of the first composition and the at least one layer of the second composition, the blocking layer defining placement of a first current electrode region, a second current electrode region and a plurality of channels;
a control electrode dielectric around each of the plurality of channels;
control electrode material around the control electrode dielectric;
a control electrode on top, bottom and sidewall surfaces of at least one of the plurality of channels; and
a spacer to isolate the control electrode material from the first current electrode region and the second current electrode region.