Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same
The present invention provides a polymer represented by the following formula 1 and a chemically amplified resist composition including the polymer, which resist composition is excellent in adhesion, storage stability and dry etch resistance, with good resolution in both C/H and L/S patterns, and provides a good pattern profile irrespective of the type of the substrate due to its good process window:
1. A copolymer consisting of repeating units l, m, n and o represented by the following Formula 1:
wherein R 1 , R 2 and R 3 are independent to one another; R 1 is hydrogen, C 1 -C 18 alkyl, C 3 -C 18 cycloalkyl, C 2 -C 18 alkoxyalkyl, or C 3 -C 18 cycloalkoxyalkyl; R 2 and R 3 are hydrogen, or C 1 -C 30 alkyl with or without an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitrile group, or an aldehyde group; R 4 and R 5 are independently hydrogen or methyl; X is an olefin compound representing a norbornene derivative; and l, m, n and o are a repeat unit of the copolymer, where l+m+n+o=1, 0.1</(l+m+n+o)<0.8, 0.1<m/(l+m+n+o)<0.7, 0.1<n/(l+m+n+o)<0.7, and 0.1<o/(l+m+n+o)<0.5.
2. The copolymer as claimed in claim 1 , wherein the repeat unit l is included in an amount of at least 10 wt. % with respect to the total weight of monomers.
3. The copolymer as claimed in claim 1 , wherein the copolymer has a weight average molecular weight of 2,000 to 1,000,000.
4. A chemically amplified resist composition comprising at least one polymer selected from the copolymers consisting of repeating units l, m, n and o represented by the following Formula 1, a photoacid generator, additives, and a solvent:
wherein R 1 , R 2 and R 3 are independent to one another; R 1 is hydrogen, C 1 -C 18 alkyl, C 3 -C 18 cycloalkyl, C 2 -C 18 alkoxyalkyl, or C 3 -C 18 cycloalkoxyalkyl; R 2 and R 3 are hydrogen, or C 1 -C 30 alkyl with or without an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitrile group, or an aldehyde group; R 4 and R 5 are independently hydrogen or methyl; X is an olefin compound representing a norbornene derivative; and l, m, n and o are a repeat unit of the copolymer, where l+m+n+o=1, 0.1<l/(l+m+n+o)<0.8, 0.1<m/(l+m+n+o)<0.7, 0.1<n/(l+m+n+o)<0.7, and 0.1<o/(l+m+n+o)<0.5.
5. The chemically amplified resist composition as claimed in claim 4 , wherein the photoacid generator includes at least one compound represented by the following formula 2 or 3:
wherein R 6 and R 7 are independently alkyl, allyl, perfluoroalkyl, benzyl, or aryl; R 8 , R 9 and R 10 are independently hydrogen, alkyl, halogen, alkoxy, aryl, thiophenoxy, thioalkoxy, or alkoxycarbonylmethoxy; and A is OSO 2 CF 3 , OSO 2 C 4 F 9 , OSO 2 C 8 F 17 , N(C 2 H 5 ) 2 , N(C 4 F 9 ) 2 , C(CF 3 ) 3 , C(C 2 F 5 ) 3 , or C(C 4 F 9 ) 3 ,
wherein R 6 to R 10 , and A are the same as defined the above formula 2.
6. The chemically amplified resist composition as claimed in claim 4 , wherein the photoacid generator is included in an amount of 0.3 to 10 parts by weight based on 100 parts by weight of the solid polymer.
7. The chemically amplified resist composition as claimed in claim 4 , wherein the at least one polymer selected from the copolymers represented by the formula 1 is included in an amount of at least 3 wt. % with respect to the total weight of the composition.
8. The chemically amplified resist composition as claimed in claim 4 , wherein the repeat unit l of the polymer represented by the formula 1 is included in an amount of at least 10 wt. % with respect to the total weight of monomers.
9. A method for forming a resist pattern comprising the steps of applying resist composition of claim 4 onto a substrate to form a coating, heat treating the coating and then exposing it to KrF, ArF, X-ray or electron beams, and developing it with a developer.