IP Library › Assignment 053108/0459
Patent Assignment
Reel/Frame 053108/0459

Assignment of Assignor's Interest

Recorded: 2020-07-02 Pages: 5
Assignor
Assignee
SK MATERIALS PERFORMANCE CO., LTD.
110-5, MYEONGHAKSANDAN-RO, YEONDONG-MYEON, SEJONG-SI, 30068, KOREA, REPUBLIC OF
Covered Properties (25)
Chemically amplified resist composition containing norbornane type low molecular additive
Patent: 6,358,666 →
Application: 09/616,859 →
Chemically Amplified Resist Composition Containing Low Molecular Weight Additives
Patent: 6,641,974 →
Application: 09/759,825 →
Publication: US 2001/0041302
Novel Acid-Labile Polymer and Resist Composition
Patent: 6,639,036 →
Application: 10/056,124 →
Publication: US 2002/0156216
Polymer for Chemically Amplified Resist and Chemically Amplified Resist Composition Containing the Same
Patent: 6,753,126 →
Application: 10/073,693 →
Publication: US 2002/0177068
Acid Generator and Thin Film Composition Containing the Same
Patent: 6,987,198 →
Application: 10/421,490 →
Publication: US 2003/0216495
Novel Polymer and Chemically Amplified Resist Composition Containing the Same
Patent: 7,285,373 →
Application: 10/940,469 →
Publication: US 2005/0153236
Copolymer of Alicyclic Olefin Having Secondary Hydroxyl Group and Acryl Compound, and Chemically Amplified Resist Composition Containing the Same
Patent: 7,326,520 →
Application: 11/108,397 →
Publication: US 2006/0057490
Light Absorbent and Organic Antireflection Coating Composition Containing the Same
Patent: 7,939,245 →
Application: 12/157,819 →
Publication: US 2009/0258321
Acid Generating Agent for Chemically Amplified Resist Compositions
Patent: 8,779,183 →
Application: 12/214,429 →
Publication: US 2009/0234155
Copolymer and Composition for Organic and Antireflective Layer
Patent: 8,021,826 →
Application: 12/214,430 →
Publication: US 2008/0318167
Acid Generating Agent for Chemically Amplified Resist Compositions
Patent: 8,241,831 →
Application: 12/231,814 →
Publication: US 2009/0291390
Onium Salt Compound, Polymer Compound Comprising the Salt Compound, Chemically Amplified Resist Composition Comprising the Polymer Compound, and Method for Patterning Using the Composition
Patent: 8,158,327 →
Application: 12/321,111 →
Publication: US 2010/0075256
Photoacid Generator Containing Aromatic Ring
Patent: 8,026,390 →
Application: 12/384,191 →
Publication: US 2010/0113818
Photoacid Generator, Copolymer, Chemically Amplified Resist Composition, and Method of Forming Pattern Using the Chemically Amplified Resist Composition
Patent: 8,283,102 →
Application: 12/416,988 →
Publication: US 2010/0143843
Organic Anti-Reflective Layer Composition Containing Ring-Opened Phthalic Anhydride and Method for Preparation Thereof
Patent: 8,357,482 →
Application: 13/186,101 →
Publication: US 2011/0272643
Polymer, Method for Producing the Same, and Resist Composition Containing the Same
Patent: 8,853,345 →
Application: 13/330,971 →
Publication: US 2012/0165499
Sulfonium Compound, Photo-Acid Generator, and Method for Manufacturing the Same
Patent: 8,865,919 →
Application: 13/341,102 →
Publication: US 2012/0172606
Photoacid Generator, Method for Producing the Same, and Resist Composition Comprising the Same
Patent: 8,889,901 →
Application: 13/367,762 →
Publication: US 2012/0203030
Photoacid Generator, Method for Producing the Same, and Resist Composition Comprising the Same
Patent: 8,617,789 →
Application: 13/367,896 →
Publication: US 2012/0203024
Copolymer for Organic Antireflective Film, Monomer, and Composition Comprising the Copolymer
Patent: 8,822,617 →
Application: 13/456,777 →
Publication: US 2012/0296059
Sulfonium Compound, Photoacid Generator, and Resist Composition
Patent: 8,853,441 →
Application: 13/557,893 →
Publication: US 2013/0035503
Organic Anti Reflective Layer Composition
Patent: 8,748,081 →
Application: 13/652,097 →
Publication: US 2013/0171565
Additive for Resist and Resist Composition Comprising Same
Patent: 9,321,875 →
Application: 13/713,779 →
Publication: US 2013/0171560
Hydrophilic Photoacid Generator and Resist Composition Comprising Same
Patent: 8,980,526 →
Application: 13/713,961 →
Publication: US 2013/0177852
Additive for Resist and Resist Composition Comprising Same
Patent: 9,063,411 →
Application: 13/714,154 →
Publication: US 2013/0171561
Related Assignments (17)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Jul 14, 2000
From: SEO, DONG CHUL; PARK, SUN YI; PARK, JOO HYEON; KIM, SEONG JU
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 010980/0211 →
Assignment of Assignor's Interest Jan 12, 2001
From: KIM, JAE YOUNG; PARK, JOO HYEON
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 011465/0644 →
Assignment of Assignor's Interest Jan 24, 2002
From: PARK, JOOHYEON; SEO, DONGCHUL; LIM, YOUNG TAEK; CHO, SEONGDUK
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 012537/0046 →
Assignment of Assignor's Interest Feb 11, 2002
From: PARK, JOOHYEON; SEO, DONGCHUL; LEE, JONGBUM; JEON, HYUNPYO
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 012586/0668 →
Assignment of Assignor's Interest Apr 22, 2003
From: PARK, JOO HYEON; LEE, JOUNG BUM; KIM, SEONG JU
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 014006/0948 →
Assignment of Assignor's Interest Sep 14, 2004
From: KIM, YOUNG-TAEK; PARK, HOO-HYEONG; SEO, DONG-CHUL; KIM, CHANG-MIN
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 015791/0615 →
Assignment of Assignor's Interest Apr 18, 2005
From: JOO, HYUNG-SANG; PARK, JOO-HYEON; SEO, DONG-CHUL; LIM, YOUNG-TAEK
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 016483/0257 →
Assignment of Assignor's Interest Jun 19, 2008
From: KIM, MYUNG-WOONG; PARK, JOO-HYEON; LIM, YOUNG-TAEK; KIM, HYUNG-GI
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 021178/0121 →
Assignment of Assignor's Interest Jun 19, 2008
From: OH, JUNG-HOON; SEO, DONG-CHEOL; JOO, HYUN-SANG; LEE, CHANG-SOO
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 021178/0134 →
Assignment of Assignor's Interest Sep 5, 2008
From: JUNG, SUNG-DO; KIM, JIN-HO; OH, JUNG-HOON; LIM, HYUN-SOON
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 021545/0739 →
Assignment of Assignor's Interest Jan 15, 2009
From: JOO, HYUN-SANG; PARK, JOO-HYEON; OH, JUNG-HOON; SHIN, DAE-HYEON
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 022174/0939 →
Assignment of Assignor's Interest Apr 1, 2009
From: OH, JUNG-HOON; SEO, DONG-CHEOL; SHIN, JIN-BONG
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 022534/0555 →
Assignment of Assignor's Interest Apr 2, 2009
From: OH, JUNG HOON; KIM, SANG JIN; KIM, JIN HO; SHIN, DAE HYEON
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 022493/0428 →
Assignment of Assignor's Interest Dec 1, 2009
From: PARK, JOO-HYEON; KIM, JI-YOUNG; LEE, JUN-HO
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 023589/0846 →
Assignment of Assignor's Interest Jul 19, 2011
From: LEE, JONG-DON; LEE, JUN-HO; BAE, SHIN-HYO; HONG, SEUNG-HEE
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 026617/0564 →
Assignment of Assignor's Interest Dec 20, 2011
From: OH, JUNG-HOON; HAN, JOON HE; KIM, TAE GON; JOO, HYUNG SANG
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 027417/0169 →
Assignment of Assignor's Interest Jan 3, 2012
From: SHIN, DAE HYEON; JOO, HYUN BANG; SEO, DONG CHUL; YOON, DAE KYUNG
To: KOREA KUMHO PETROCHEMICAL CO., LTD.
Reel/Frame 027521/0327 →