Organic anti reflective layer composition
Disclosed is an organic antireflective film composition which includes a monomer containing two or more thiol groups and a monomer containing two or more vinyl groups, as crosslinking agents. When the organic antireflective film composition is used, an antireflective film formed from the composition can be rapidly etched in an ultrafine pattern forming process, and the curing rate can be increased, while the etching rate is increased, without using an acid generator and a curing agent or by using the agents only in small amounts.
1. An organic antireflective film composition comprising:
a first monomer containing two or more thiol groups and a second monomer containing two or more vinyl groups, as crosslinking agents; and
a polymer containing hydroxyethyl (meth)acrylate and chlorobenzyl (meth)acrylate as repeating units.
2. The organic antireflective film composition according to claim 1 , wherein the first monomer is any one selected from the group consisting of compounds represented by the following formula (1) to formula (4):
[Chemical Formula 1]
HS—R 1 —S—R 2 —SH (1)
wherein in the formula (1), R 1 and R 2 each independently represent an alkylene group having 1 to 30 carbon atoms, a cycloalkylene group having 3 to 30 carbon atoms, an arylene group having 6 to 30 carbon atoms, or a heteroarylene group having 2 to 30 carbon atoms;
[Chemical Formula 2]
HS—R 3 —SH (2)
wherein in the formula (2), R 3 represents an alkylene group having 1 to 30 carbon atoms, a cycloalkylene group having 3 to 30 carbon atoms, an arylene group having 6 to 30 carbon atoms, or a heteroarylene group having 2 to 30 carbon atoms;
wherein in the formula (3), R 4 , R 5 , R 6 and R 7 each independently represent any one selected from the group consisting of
a hydrogen atom, and an alkyl group having 1 or 10 carbon atoms; two or more of R 4 , R 5 , R 6 and R 7 represent
R 31 and R 32 each independently represent an alkylene group having 1 to 30 carbon atoms; and a and b each independently represent an integer of 0 or 1; and
wherein in the formula (4), R 8 , R 9 and R 10 each independently represent any one selected from the group consisting of
a hydrogen atom, and an alkyl group having 1 or 10 carbon atoms; two or more of R 8 , R 9 and R 10 represent
R 31 and R 32 each independently represent an alkylene group having 1 to 30 carbon atoms; and a and b each independently represent an integer of 0 or 1.
3. The organic antireflective film composition according to claim 1 , wherein the second monomer is any one selected from the group consisting of compounds represented by the following formula (5) to formula (7):
wherein in the formula (5), A represents any one selected from the group consisting of a cycloalkylene group having 3 to 30 carbon atoms, a heterocycloalkylene group having 2 to 30 carbon atoms, an arylene group having 6 to 30 carbon atoms, and a heteroarylene group having 2 to 30 carbon atoms; R 11 , R 12 , R 13 and R 14 each independently represent an alkylene group having 1 to 30 carbon atoms; R 21 , R 22 , R 23 and R 24 each independently represent
R 33 represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms; and 1, m, n, o, x and y each independently represent an integer of 0 or 1;
wherein in the formula (6), R 25 to R 30 each independently represent any one selected from the group consisting of
a hydrogen atom, and an alkyl group having 1 to 10 carbon atoms; two or more of R 25 to R 30 represent
R 33 represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms; and p and q each independently represent an integer from 1 to 10; and
wherein in the formula (7), R 15 , R 16 and R 17 each independently represent any one selected from the group consisting of
a hydrogen atom, and an alkyl group having 1 to 10 carbon atoms; two or more of R 15 , R 16 and R 17 represent
R 34 represents a hydrogen atom or an alkylene group having 1 to 10 carbon atoms; and c represents an integer of 0 or 1.
4. The organic antireflective film composition according to claim 1 , wherein the first monomer is any one selected from the group consisting of compounds represented by the following formula (8) to formula (14):
5. The organic antireflective film composition according to claim 1 , wherein the second monomer is any one selected from the group consisting of compounds represented by the following formula (15) to formula (19):
6. The organic antireflective film composition according to claim 1 , wherein the organic antireflective film composition contains the first monomer and the second monomer at a weight ratio of 1:99 to 99:1.
7. The organic antireflective film composition according to claim 1 , wherein the organic antireflective film composition contains the first monomer at a proportion of 0.01% to 40% by weight and the second monomer at a proportion of 0.01% to 40% by weight, relative to the total amount of the organic antireflective film composition.
8. The organic antireflective film composition according to claim 1 , further comprising a light absorbing agent, an acid generator, a curing agent and an organic solvent.
9. The organic antireflective film composition according to claim 8 , wherein the organic antireflective film composition contains the light absorbing agent at a proportion of 0.01% to 30% by weight, the acid generator at a proportion of 0.01% to 10% by weight, and the curing agent at a proportion of 0.01% to 30% by weight, all relative to the total amount of the organic antireflective film composition.