Cleaning bench for removing contaminants from semiconductor process equipment
View Patent ↗Described are cleaning benches and methods for removing contaminant layers from semiconductor process components using small volumes of hazardous liquids and minimizing cross-contamination between components from different deposition chambers. Components to be cleaned are stored within or supported by a dedicated cassette before they are placed in a receptacle of cleaning liquid. The cassette displaces a significant percentage of the receptacle's volume; consequently, only a relatively small volume of cleaning liquid is needed to fully submerge the component. In typical embodiments, the combined cassette and component displace a volume of liquid that is greater than the volume of liquid used to clean the component. The cleaning bench can include different chemical baths for different components. Cassettes dedicated for use with particular components can be keyed to particular receptacles.
1. A cleaning bench comprising:
a. a unitary first receptacle receiving a first component of a first component shape and a first volume of a first liquid, the first liquid selected to remove a first contaminant layer from the first component, the first receptacle having a first receptacle shape similar to at least a portion of the first component shape, wherein the first receptacle includes a cassette defining at least a portion of the first receptacle shape; and
b. a unitary second receptacle receiving a second component of a second component shape and a second volume of a second liquid, the second liquid selected to remove a second contaminant layer from the second component, the second receptacle having a second receptacle shape similar to at least a portion of the second component shape.
2. The cleaning bench of claim 1 , wherein the first component shape differs from the second component shape.
3. The cleaning bench of claim 1 , wherein the cassette encloses the first component within the first receptacle.
4. The cleaning bench of claim 3 , wherein the cassette is textured to allow the first liquid access to the surface of the first component.
5. The cleaning bench of claim 1 , wherein the first and second receptacles include include respective first and second inlets admitting the respective first and second volumes of liquid.
6. The cleaning bench of claim 1 , further comprising first and second waste reservoirs, the first receptacle including a first drain to the first reservoir and the second receptacle including a second drain to the second reservoir.
7. The cleaning bench of claim 6 , wherein each of the first and second reservoirs includes a respective vent.
8. The cleaning bench of claim 1 , wherein the first and second receptacles are uniquely keyed within the bench.
9. The cleaning bench of claim 1 , wherein the cassette is keyed to just one of the first and second receptacles.
10. The cleaning bench of claim 9 , wherein the cassette encloses the first component within the first receptacle.
11. The cleaning bench of claim 1 , wherein the first component shape is substantially circular.
12. The cleaning bench of claim 11 , wherein the first and second components are semiconductor process equipment.
13. A cleaning bench comprising:
a. a unitary first receptacle receiving a first component of a first component shape and a first volume of a first liquid, the first liquid selected to remove a first contaminant contaminant layer from the first component, the first receptacle having a first receptacle shape similar to at least a portion of the first component shape, wherein the first contaminant layer is disposed over a substrate material, and wherein the first receptacle includes a mark identifying at least one of the first liquid, the first component, and the substrate material; and
b. a unitary second receptacle receiving a second component of a second component shape and a second volume of a second liquid, the second liquid selected to remove a second contaminant layer from the second component, the second receptacle having a second receptacle shape similar to at least a portion of the second component shape.
14. A cleaning bench comprising:
a. a unitary first receptacle receiving a first component of a first component shape and a first volume of a first liquid, the first liquid selected to remove a first contaminant layer from the first component, the first receptacle having a first receptacle shape similar to at least a portion of the first component shape;
b. a handle supporting the first component in the first receptacle, the handle including a pommel adapted to cover the first receptacle; and
c. a unitary second receptacle receiving a second component of a second component shape and a second volume of a second liquid, the second liquid selected to remove a second contaminant layer from the second component, the second receptacle having a second receptacle shape similar to at least a portion of the second component shape.
15. A cleaning bench comprising:
a. a unitary first receptacle receiving a first component of a first component shape and a first volume of a first liquid, the first liquid selected to remove a first contaminant layer from the first component, the first receptacle having a first receptacle shape similar to at least a portion of the first component shape;
b. a unitary second receptacle receiving a second component of a second component shape and a second volume of a second liquid, the second liquid selected to remove a second contaminant layer from the second component, the second receptacle having a second receptacle shape similar to at least a portion of the second component shape; and
c. a plurality of cassettes for insertion into the first and second receptacles and a rack for hanging the cassettes.
16. A cleaning bench comprising:
a. a first receptacle receiving a first component of a first component shape and a first volume of a first liquid, the first liquid selected to remove a first contaminant layer from the first component, the first receptacle having a first receptacle shape similar to at least a portion of the first component shape;
b. a second receptacle receiving a second component of a second component shape and a second volume of a second liquid, the second liquid selected to remove a second contaminant layer from the second component, the second receptacle having a second receptacle shape similar to at least a portion of the second component shape;
c. means for displacing, in combination with the first component, at least half the first receptacle volume; and
d. means for displacing, in combination with the second component, at least half the second receptacle volume.
17. The cleaning bench of claim 16 , wherein the first component shape is substantially circular.
18. The cleaning bench of claim 17 , wherein the first and second components are semiconductor process equipment.