IP Library Assignment 026468/0130
Patent Assignment
Reel/Frame 026468/0130

Security Agreement

Recorded: 2011-06-21 Pages: 8
Assignor
QUANTUM GLOBAL TECHNOLOGIES, LLC
Executed: 2011-06-09
Assignee
FOX CHASE BANK
4390 DAVISVILLE ROAD, HATBORO, PENNSYLVANIA, 19040
Covered Properties (48)
Method of Removing Sputter Deposition from Components of Vacuum Deposition Equipment
Patent: 5,660,640 →
Application: 08/491,154 →
Apparatus and Method for the Immersion Cleaning and Transport of Semiconductor Components
Patent: 5,651,797 →
Application: 08/511,975 →
Apparatus for Obtaining, Storing and Transporting Liquid Samples and Methods for Making and Using Same
Patent: 5,804,744 →
Application: 08/723,861 →
Carbon Dioxide Cleaning Process
Patent: 6,004,400 →
Application: 08/890,116 →
Method and Apparatus for Storing and Shipping Hazardous Materials
Patent: 6,003,666 →
Application: 08/992,204 →
Apparatus for Obtaining, Storing and Transporting Liquid Samples and Methods for Making and Using Same
Patent: 5,996,424 →
Application: 09/052,871 →
Process for Cleaning Ceramic Articles
Patent: 6,296,716 →
Application: 09/470,510 →
Volume Efficient Cleaning Systems
Patent: 6,530,388 →
Application: 09/504,299 →
Container for transporting refurbished semiconductor processing equipment
Patent: 6,230,895 →
Application: 09/642,051 →
Steam Cleaning System and Method for Semiconductor Process Equipment
Patent: 6,648,982 →
Application: 09/879,412 →
Process for Cleaning Ceramic Articles
Patent: 6,565,667 →
Application: 09/896,991 →
Publication: US 2002/0006766
Method for Cleaning Semiconductor Fabrication Equipment Parts
Patent: 6,810,887 →
Application: 09/927,263 →
Publication: US 2004/0045574
Cleaning of Semiconductor Process Equipment Chamber Parts Using Organic Solvents
Patent: 6,607,605 →
Application: 09/945,259 →
Publication: US 2002/0066466
Process for Cleaning Components Using Cleaning Media
Patent: 6,554,909 →
Application: 10/010,470 →
Semiconductor Processing Component Having Low Surface Contaminant Concentration
Patent: 6,723,437 →
Application: 10/078,930 →
Publication: US 2002/0168867
Volume Efficient Cleaning Methods and Systems
Patent: 6,637,444 →
Application: 10/288,404 →
Method of Cleaning a Coated Process Chamber Component
Patent: 6,902,628 →
Application: 10/304,535 →
Publication: US 2004/0099285
System for Removing Contaminants from Semiconductor Process Equipment
Patent: 6,926,016 →
Application: 10/622,393 →
Cleaning Process and Apparatus for Silicate Materials
Patent: 7,045,072 →
Application: 10/627,185 →
Publication: US 2005/0016958
Ultrasonic Assisted Etch Using Corrosive Liquids
Patent: 7,091,132 →
Application: 10/627,416 →
Publication: US 2005/0016959
Method for Removing a Composite Coating Containing Tantalum Deposition and Arc Sprayed Aluminum from Ceramic Substrates
Patent: 7,097,713 →
Application: 10/643,409 →
Publication: US 2005/0039774
Steam Cleaning System and Method for Semiconductor Process Equipment
Patent: 6,936,114 →
Application: 10/664,351 →
Cleaning Processes for Silicon Carbide Materials
Patent: 7,754,609 →
Application: 10/696,394 →
Cleaning Chamber Surfaces to Recover Metal-Containing Compounds
Patent: 6,902,627 →
Application: 10/742,604 →
Publication: US 2004/0163669
Process for producing semi-conductor coated substrate
Application: 10/807,716 →
Publication: US 2005/0215059
Textured Chamber Surface
Patent: 7,618,769 →
Application: 10/863,151 →
Publication: US 2005/0271984
Electrochemical Removal of Tantalum-Containing Materials
Patent: 7,964,085 →
Application: 10/870,716 →
Methods for Removing Silicon and Silicon-Nitride Contamination Layers from Deposition Tubes
Patent: 7,267,132 →
Application: 11/054,794 →
Publication: US 2005/0217705
Apparatus for Applying Disparate Etching Solutions to Interior and Exterior Surfaces
Patent: 7,073,522 →
Application: 11/055,180 →
Publication: US 2005/0217695
Cleaning Process and Apparatus for Silicate Materials
Patent: 7,452,475 →
Application: 11/061,013 →
Publication: US 2005/0167393
Cleaning Bench for Removing Contaminants from Semiconductor Process Equipment
Patent: 7,328,712 →
Application: 11/128,684 →
Steam Cleaning System and Method for Semiconductor Process Equipment
Patent: 7,108,002 →
Application: 11/144,551 →
Method and Apparatus for the Application of Twin Wire Arc Spray Coatings
Patent: 7,554,052 →
Application: 11/192,600 →
Publication: US 2007/0026159
Apparatus and methods for slurry cleaning of etch chambers
Application: 11/272,844 →
Publication: US 2007/0111642
Method for Removing Aluminum Fluoride Contamination from Aluminum-Containing Surfaces of Semiconductor Process Equipment
Patent: 7,624,742 →
Application: 11/360,238 →
System and method for cleaning semiconductor fabrication equipment parts
Application: 11/400,125 →
Publication: US 2006/0180180
Ultrasonic Assisted Etch Using Corrosive Liquids
Patent: 7,377,991 →
Application: 11/477,191 →
Publication: US 2006/0243390
Apparatus for Applying Disparate Etching Solutions to Interior and Exterior Surfaces
Patent: 7,448,397 →
Application: 11/479,883 →
Removing Residues from Substrate Processing Components
Application: 11/551,114 →
Publication: US 2008/0092806
Firepolished Quartz Parts for Use in Semiconductor Processing
Patent: 7,541,094 →
Application: 11/712,802 →
Methods and Apparatus for Cleaning Chamber Components
Patent: 7,789,969 →
Application: 11/931,272 →
Publication: US 2008/0099054
Cleaning Process Residues from Substrate Processing Chamber Components
Patent: 8,118,946 →
Application: 11/948,766 →
Publication: US 2009/0139540
Cleaning Bench for Removing Contaminants from Semiconductor Process Equipment
Patent: 7,427,330 →
Application: 12/069,836 →
Methods and Apparatus for Cleaning Deposition Chamber Parts Using Selective Spray Etch
Application: 12/146,676 →
Publication: US 2009/0000641
Methods and Apparatus for Ex Situ Seasoning of Electronic Device Manufacturing Process Components
Patent: 8,492,674 →
Application: 12/189,141 →
Publication: US 2009/0043416
Methods for Cleaning Process Kits and Chambers, and for Ruthenium Recovery
Patent: 8,097,089 →
Application: 12/339,037 →
Publication: US 2009/0197004
Textured Chamber Surface
Patent: 8,142,989 →
Application: 12/618,693 →
Publication: US 2010/0059366
Method and Apparatus for Showerhead Cleaning
Patent: 8,372,211 →
Application: 12/881,503 →
Publication: US 2011/0061685
Related Assignments (25)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Jun 16, 1995
From: LAUBE, DAVID P.
To: JORAY CORPORATION
Reel/Frame 007569/0695 →
Assignment of Assignor's Interest Aug 7, 1995
From: LAUBE, DAVID P.
To: JORAY CORPORATION
Reel/Frame 007623/0894 →
Assignment of Assignor's Interest Jan 27, 1997
From: TAN, SAMANTHA S.H.; DOUGHERTY, DIANNE M.
To: CHEMTRACE
Reel/Frame 008494/0819 →
Assignment of Assignor's Interest Jan 9, 1998
From: HARROVER, ALEXANDER J.
To: BISHOP, PHILLIP W.
Reel/Frame 008903/0917 →
Assignment of Assignor's Interest May 4, 1998
From: DOUGHERTY, DIANNE M.
To: CHEMTRACE
Reel/Frame 009148/0418 →
Assignment of Assignor's Interest Oct 22, 1999
From: JORAY CORPORATION, AN ARIZONA CORPORATION
To: JORAY CORPORATION
Reel/Frame 010321/0503 →
Assignment of Assignor's Interest Apr 7, 2000
From: HAERLE, ANDREW G.; MEDER, GERALD S.
To: SAINT-GOBAIN INDUSTRIAL CERAMICS, INC.
Reel/Frame 010737/0582 →
Change of Name Oct 19, 2000
From: SAINT-GOBAIN INDUSTRIAL CERAMICS, INC.
To: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
Reel/Frame 011191/0441 →
Assignment of Assignor's Interest Jan 22, 2001
From: LAUBE, DAVID P.
To: BOC GROUP INCORPORATED THE
Reel/Frame 011465/0153 →
Assignment of Assignor's Interest Jun 11, 2001
From: ZUCK, DAVID S.; MACURA, KURTIS R.
To: QUANTUMCLEAN
Reel/Frame 011902/0428 →
Assignment of Assignor's Interest Jul 18, 2001
From: SAINT-GOBAIN INDUSTRIAL CERAMICS, INC.
To: SAINT-GOBAIN CERAMICS AND PLASTICS, INC.
Reel/Frame 012009/0764 →
Assignment of Assignor's Interest Sep 24, 2001
From: ZUCK, DWIGHT J.; ZUCK, DAVID S.
To: QUANTUM GLOBAL TECHNOLOGIES, LLC
Reel/Frame 012192/0063 →
Assignment of Assignor's Interest Nov 8, 2001
From: HAERLE, ANDREW G.; PERRY, EDWARD A.
To: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
Reel/Frame 012366/0262 →
Assignment of Assignor's Interest Jan 7, 2002
From: TAN, SAMANTHA
To: CHEMTRACE CORPORATION
Reel/Frame 012444/0820 →
Re-Record to Correct the Assignee's Name on Reel 011902 Frame 0428. Assignors Hereby Confirm the Assignment of the Entire Interest. Jan 29, 2002
From: ZUCK, DAVID S.; MACURA, KURTIS R.
To: QUANTUM GLOBAL TECHNOLOGIES, LLC
Reel/Frame 012571/0814 →
Assignment of Assignor's Interest Feb 8, 2002
From: TAN, SDAMANTHA
To: CHEMTRACE CORPORATION
Reel/Frame 012563/0910 →
Assignment of Assignor's Interest Nov 4, 2002
From: ZUCK, DWIGHT J.; ZUCK, DAVID S.
To: QUANTUM GLOBAL TECHNOLOGIES, LLC
Reel/Frame 013466/0065 →
Assignment of Assignor's Interest Apr 7, 2003
From: WANG, HONG; HE, YONGXIANG; STOW, CLIFFORD C.
To: APPLIED MATERIALS, INC.
Reel/Frame 013568/0798 →
Assignment of Assignor's Interest Dec 29, 2003
From: TAN, SAMANTHA; CHEN, NING
To: CHEMTRACE CORPORATION
Reel/Frame 014838/0343 →
Assignment of Assignor's Interest Feb 2, 2004
From: TAN, SAMANTHA; CHEN, NING
To: CHEMTRACE CORPORATION
Reel/Frame 014936/0127 →
Assignment of Assignor's Interest Apr 5, 2004
From: BURGESS, REGINALD RONALD; DAVIS, IAN MARTIN
To: BOC GROUP, INC., THE
Reel/Frame 015175/0369 →
Reassignment Oct 19, 2004
From: CHEMTRACE CORPORATION
To: CHEMTRACE PRECISION CLEANING, INC.
Reel/Frame 015260/0181 →
Reassignment Oct 19, 2004
From: CHEM TRACE CORPORATION
To: CHEM TRACE PRECISION CLEANING, INC.
Reel/Frame 015283/0261 →
Reassignment Oct 19, 2004
From: CHEM TRACE CORPORATION
To: CHEM TRACE PRECISION CLEANING, INC.
Reel/Frame 015260/0174 →
Reassignment Oct 19, 2004
From: CHEMTRACE CORPORATION
To: CHEMTRACE PRECISION CLEANING, INC.
Reel/Frame 015259/0140 →