Methods and apparatus for ex situ seasoning of electronic device manufacturing process components
View Patent ↗In one aspect, a method of improving the performance of an electronic device manufacturing facility is provided, including the step of reducing the number of electronic device manufacturing component seasoning steps which are performed using production equipment, whereby the amount of electronic device manufacturing system downtime is reduced. Several other aspects are provided.
1. A method for seasoning a component of a process chamber for manufacturing an electronic device, the component having a face-side, a backside, and a surface defining an orifice that extends between the face-side and the backside, the method comprising:
placing the component on a fixture in a seasoning chamber, the fixture being configured so that ends of the orifice are exposed when the component is on the fixture;
exposing the component to a plasma;
forcing the plasma through the orifice by creating a pressure differential across the face-side and the backside of the component;
removing the component from the seasoning chamber after the surface that defines the orifice and the backside of the component have been coated by the plasma; and
subsequently installing the component in the process chamber.
2. The method of claim 1 further comprising: prior to installing the component into the process chamber, determining whether the component meets a predetermined quality standard.
3. The method of claim 1 wherein the component is a new component.
4. The method of claim 1 wherein the component is a reconditioned component.
5. The method of claim 2 wherein the predetermined quality standard comprises the maximum number of in situ seasoning cycles which the ex situ seasoned component would be required to undergo before being placed into service.
6. The method of claim 1 wherein the process chamber is part of an electronic device manufacturing system selected from the group consisting of chemical mechanical polishing, chemical deposition, ion implantation, epitaxial crystal growth, plasma, oxidation, photolithography, diffusion, metallization, and cleaning systems.
7. The method of claim 1 wherein the step of forcing the plasma through the orifice comprises drawing the plasma through the orifice using a pump.
8. The method of claim 1 further comprising the fixture is adapted to form a seal with the component.
9. The method of claim 8 further comprising the step of reducing a pressure within the fixture whereby the plasma is drawn through the orifice.
10. The method of claim 9 further comprising the step of connecting a vacuum pump to the fixture.