Patent Assignment
Reel/Frame 046962/0614
Release of Security Interest
Recorded: 2018-08-28
Pages: 8
Assignor
UNIVEST BANK AND TRUST CO., SUCCESSOR BY MERGER TO FOX CHASE BANK
Executed: 2018-08-27
Assignee
QUANTUM GLOBAL TECHNOLOGIES, LLC
1900 AM DRIVE, QUAKERTOWN, PENNSYLVANIA, 18951
Covered Properties
(46)
Process for Producing Semi-Conductor Coated Substrate
PCT:
PCT/US2005/009108 ↗
Removing Residues from Substrate Processing Components
PCT:
PCT/US2007/022005 ↗
Method of Removing Sputter Deposition from Components of Vacuum Deposition Equipment
Patent:
5,660,640 →
Application:
08/491,154 →
Apparatus and Method for the Immersion Cleaning and Transport of Semiconductor Components
Patent:
5,651,797 →
Application:
08/511,975 →
Apparatus for Obtaining, Storing and Transporting Liquid Samples and Methods for Making and Using Same
Patent:
5,804,744 →
Application:
08/723,861 →
Carbon Dioxide Cleaning Process
Patent:
6,004,400 →
Application:
08/890,116 →
Method and Apparatus for Storing and Shipping Hazardous Materials
Patent:
6,003,666 →
Application:
08/992,204 →
Apparatus for Obtaining, Storing and Transporting Liquid Samples and Methods for Making and Using Same
Patent:
5,996,424 →
Application:
09/052,871 →
Volume Efficient Cleaning Systems
Patent:
6,530,388 →
Application:
09/504,299 →
Container for transporting refurbished semiconductor processing equipment
Patent:
6,230,895 →
Application:
09/642,051 →
Steam Cleaning System and Method for Semiconductor Process Equipment
Patent:
6,648,982 →
Application:
09/879,412 →
Method for Cleaning Semiconductor Fabrication Equipment Parts
Cleaning of Semiconductor Process Equipment Chamber Parts Using Organic Solvents
Process for Cleaning Components Using Cleaning Media
Patent:
6,554,909 →
Application:
10/010,470 →
Volume Efficient Cleaning Methods and Systems
Patent:
6,637,444 →
Application:
10/288,404 →
Method of Cleaning a Coated Process Chamber Component
System for Removing Contaminants from Semiconductor Process Equipment
Patent:
6,926,016 →
Application:
10/622,393 →
Cleaning Process and Apparatus for Silicate Materials
Ultrasonic Assisted Etch Using Corrosive Liquids
Method for Removing a Composite Coating Containing Tantalum Deposition and Arc Sprayed Aluminum from Ceramic Substrates
Steam Cleaning System and Method for Semiconductor Process Equipment
Patent:
6,936,114 →
Application:
10/664,351 →
Cleaning Processes for Silicon Carbide Materials
Patent:
7,754,609 →
Application:
10/696,394 →
Cleaning Chamber Surfaces to Recover Metal-Containing Compounds
Textured Chamber Surface
Electrochemical Removal of Tantalum-Containing Materials
Patent:
7,964,085 →
Application:
10/870,716 →
Methods for Removing Silicon and Silicon-Nitride Contamination Layers from Deposition Tubes
Apparatus for Applying Disparate Etching Solutions to Interior and Exterior Surfaces
Cleaning Process and Apparatus for Silicate Materials
Cleaning Bench for Removing Contaminants from Semiconductor Process Equipment
Patent:
7,328,712 →
Application:
11/128,684 →
Steam Cleaning System and Method for Semiconductor Process Equipment
Patent:
7,108,002 →
Application:
11/144,551 →
Method and Apparatus for the Application of Twin Wire Arc Spray Coatings
Apparatus and methods for slurry cleaning of etch chambers
Application:
11/272,844 →
Publication:
US 2007/0111642
Method for Removing Aluminum Fluoride Contamination from Aluminum-Containing Surfaces of Semiconductor Process Equipment
Patent:
7,624,742 →
Application:
11/360,238 →
System and method for cleaning semiconductor fabrication equipment parts
Application:
11/400,125 →
Publication:
US 2006/0180180
Ultrasonic Assisted Etch Using Corrosive Liquids
Apparatus for Applying Disparate Etching Solutions to Interior and Exterior Surfaces
Patent:
7,448,397 →
Application:
11/479,883 →
Firepolished Quartz Parts for Use in Semiconductor Processing
Patent:
7,541,094 →
Application:
11/712,802 →
Methods and Apparatus for Cleaning Chamber Components
Cleaning Process Residues from Substrate Processing Chamber Components
Cleaning Bench for Removing Contaminants from Semiconductor Process Equipment
Patent:
7,427,330 →
Application:
12/069,836 →
Methods and Apparatus for Cleaning Deposition Chamber Parts Using Selective Spray Etch
Application:
12/146,676 →
Publication:
US 2009/0000641
Methods and Apparatus for Ex Situ Seasoning of Electronic Device Manufacturing Process Components
Methods for Cleaning Process Kits and Chambers, and for Ruthenium Recovery
Textured Chamber Surface
Method and Apparatus for Showerhead Cleaning
Methods and Apparatus for Cleaning Deposition Chamber Parts Using Selective Spray Etch
Related Assignments
(25)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jun 16, 1995
From: LAUBE, DAVID P.
To: JORAY CORPORATION
Reel/Frame 007569/0695 →
Assignment of Assignor's Interest
Aug 7, 1995
From: LAUBE, DAVID P.
To: JORAY CORPORATION
Reel/Frame 007623/0894 →
Assignment of Assignor's Interest
Jan 27, 1997
From: TAN, SAMANTHA S.H.; DOUGHERTY, DIANNE M.
To: CHEMTRACE
Reel/Frame 008494/0819 →
Assignment of Assignor's Interest
Jan 9, 1998
From: HARROVER, ALEXANDER J.
To: BISHOP, PHILLIP W.
Reel/Frame 008903/0917 →
Assignment of Assignor's Interest
May 4, 1998
From: DOUGHERTY, DIANNE M.
To: CHEMTRACE
Reel/Frame 009148/0418 →
Assignment of Assignor's Interest
Oct 22, 1999
From: JORAY CORPORATION, AN ARIZONA CORPORATION
To: JORAY CORPORATION
Reel/Frame 010321/0503 →
Assignment of Assignor's Interest
Jan 22, 2001
From: LAUBE, DAVID P.
To: BOC GROUP INCORPORATED THE
Reel/Frame 011465/0153 →
Assignment of Assignor's Interest
Jun 11, 2001
From: ZUCK, DAVID S.; MACURA, KURTIS R.
To: QUANTUMCLEAN
Reel/Frame 011902/0428 →
Assignment of Assignor's Interest
Sep 24, 2001
From: ZUCK, DWIGHT J.; ZUCK, DAVID S.
To: QUANTUM GLOBAL TECHNOLOGIES, LLC
Reel/Frame 012192/0063 →
Assignment of Assignor's Interest
Nov 8, 2001
From: HAERLE, ANDREW G.; PERRY, EDWARD A.
To: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
Reel/Frame 012366/0262 →
Assignment of Assignor's Interest
Jan 7, 2002
From: TAN, SAMANTHA
To: CHEMTRACE CORPORATION
Reel/Frame 012444/0820 →
Re-Record to Correct the Assignee's Name on Reel 011902 Frame 0428. Assignors Hereby Confirm the Assignment of the Entire Interest.
Jan 29, 2002
From: ZUCK, DAVID S.; MACURA, KURTIS R.
To: QUANTUM GLOBAL TECHNOLOGIES, LLC
Reel/Frame 012571/0814 →
Assignment of Assignor's Interest
Feb 8, 2002
From: TAN, SDAMANTHA
To: CHEMTRACE CORPORATION
Reel/Frame 012563/0910 →
Assignment of Assignor's Interest
Nov 4, 2002
From: ZUCK, DWIGHT J.; ZUCK, DAVID S.
To: QUANTUM GLOBAL TECHNOLOGIES, LLC
Reel/Frame 013466/0065 →
Assignment of Assignor's Interest
Apr 7, 2003
From: WANG, HONG; HE, YONGXIANG; STOW, CLIFFORD C.
To: APPLIED MATERIALS, INC.
Reel/Frame 013568/0798 →
Assignment of Assignor's Interest
Sep 16, 2003
From: ZUCK, DAVID S.; MACURA, KURTIS R.
To: QUANTUM GLOBAL TECHNOLOGIES, LLC
Reel/Frame 014516/0303 →
Assignment of Assignor's Interest
Dec 29, 2003
From: TAN, SAMANTHA; CHEN, NING
To: CHEMTRACE CORPORATION
Reel/Frame 014838/0343 →
Assignment of Assignor's Interest
Feb 2, 2004
From: TAN, SAMANTHA; CHEN, NING
To: CHEMTRACE CORPORATION
Reel/Frame 014936/0127 →
Assignment of Assignor's Interest
Mar 29, 2004
From: TAN, SAMANTHA S.H.
To: CHEMTRACE CORPORATION
Reel/Frame 015157/0518 →
Assignment of Assignor's Interest
Apr 5, 2004
From: BURGESS, REGINALD RONALD; DAVIS, IAN MARTIN
To: BOC GROUP, INC., THE
Reel/Frame 015175/0369 →
Assignment of Assignor's Interest
May 10, 2004
From: BRUECKNER, KARL; WANG, HONG
To: APPLIED MATERIALS, INC.
Reel/Frame 015313/0655 →
Reassignment
Oct 19, 2004
From: CHEMTRACE CORPORATION
To: CHEMTRACE PRECISION CLEANING, INC.
Reel/Frame 015259/0140 →
Reassignment
Oct 19, 2004
From: CHEM TRACE CORPORATION
To: CHEM TRACE PRECISION CLEANING, INC.
Reel/Frame 015260/0174 →
Reassignment
Oct 19, 2004
From: CHEMTRACE CORPORATION
To: CHEMTRACE PRECISION CLEANING, INC.
Reel/Frame 015260/0181 →
Reassignment
Oct 19, 2004
From: CHEM TRACE CORPORATION
To: CHEM TRACE PRECISION CLEANING, INC.
Reel/Frame 015283/0261 →