Method and apparatus for fast disturbance detection and classification

1. A computer-implemented method, comprising:

determining a pattern based on a plurality of probabilities associated with a corresponding plurality of wafer processing parameters, the plurality of wafer processing parameters being determined by at least one measurement device following processing by at least one processing tool;

determining a type of a disturbance based upon the pattern;

conveying information indicative of the determined type of the disturbance;

detecting the disturbance based upon at least one of the plurality of wafer processing parameters; and

selecting a first plurality of processing runs in response to detecting the disturbance, the first plurality of processing runs being performed substantially before the disturbance occurred.

2. The method of claim 1 , further comprising selecting a second plurality of processing runs in response to detecting the disturbance, the second plurality of processing runs being performed approximately at the same time or substantially after the disturbance occurred.

3. The method of claim 2 , further comprising determining the plurality of probabilities based on the first and second pluralities of processing runs.

4. The method of claim 3 , wherein determining the plurality of probabilities based on the first and second plurality of processing runs comprises determining the plurality of probabilities based on at least one wafer processing parameter associated with at least one wafer processed during each of the second plurality of processing runs.

5. The method of claim 4 , wherein determining the plurality of probabilities comprises determining a probability that said at least one wafer processing parameter is indicative of the type of the disturbance.

6. The method of claim 1 , wherein determining the type of the disturbance comprises comparing the pattern to at least one predetermined pattern associated with at least one type of disturbance.

7. A computer-implemented method, comprising:

determining a pattern based on a plurality of probabilities associated with a corresponding plurality of wafer processing parameters, the plurality of wafer processing parameters being determined by at least one measurement device following processing by at least one processing tool;

determining a type of a disturbance based upon the pattern, wherein determining the type of the disturbance comprises comparing the pattern to at least one predetermined pattern associated with at least one type of disturbance, and wherein comparing the pattern to said at least one predetermined pattern comprises comparing the pattern to at least one predetermined pattern associated with at least one of a step disturbance and an impulse disturbance;

conveying information indicative of the determined type of the disturbance.

8. The method of claim 7 , wherein comparing the pattern to said at least one predetermined pattern comprises comparing the pattern to at least one threshold associated with the at least one predetermined pattern.

9. The method of claim 7 , wherein determining the type of the disturbance comprises selecting the step disturbance or the impulse disturbance based on the comparison.

10. The method of claim 9 , further comprising tracking the step disturbance in response to selecting the step disturbance.

11. The method of claim 9 , further comprising rejecting data associated with the impulse in response to selecting the impulse disturbance.

12. An apparatus, comprising:

at least one processing tool for processing wafers;

at least one measurement tool for measuring wafer processing parameters; and

an disturbance analysis unit configured to:

determine a pattern based on a plurality of probabilities associated with a corresponding plurality of wafer processing parameters;

determine a type of a disturbance based upon the pattern;

detect the disturbance based upon at least one of the plurality of wafer processing parameters; and

select a first plurality of processing runs in response to detecting the disturbance, the first plurality of processing runs being performed substantially before the disturbance occurred.

13. The apparatus of claim 12 , wherein said at least one processing tool comprises at least one of a deposition tool, an ion implantation tool, an etching tool, a polishing tool, and a masking tool.

14. The apparatus of claim 12 , wherein said at least one measurement tool comprises at least one of a metrology tool and a wafer electrical test tool.

15. The apparatus of claim 12 , wherein the disturbance analysis unit is configured to detect the disturbance based upon at least one of the plurality of wafer processing parameters.

16. The apparatus of claim 12 , wherein the disturbance analysis unit is configured to select a second plurality of processing runs in response to detecting the disturbance, the second plurality of processing runs being performed approximately at the same time or substantially after the disturbance occurred.

17. The apparatus of claim 16 , wherein the disturbance analysis unit is configured to determine the plurality of probabilities based on the first and second pluralities of processing runs.

18. The apparatus of claim 17 , wherein the disturbance analysis unit is configured to determine the plurality of probabilities based on at least one wafer processing parameter associated with at least one wafer processed during each of the second plurality of processing runs.

19. The apparatus of claim 18 , wherein the disturbance analysis unit is configured to determine a probability that said at least one wafer processing parameter is indicative of the type of the disturbance.

20. The apparatus of claim 12 , wherein the disturbance analysis unit is configured to compare the pattern to at least one predetermined pattern associated with at least one type of disturbance.

21. An apparatus, comprising:

at least one processing tool for processing wafers;

at least one measurement tool for measuring wafer processing parameters; and

an disturbance analysis unit configured to:

determine a pattern based on a plurality of probabilities associated with a corresponding plurality of wafer processing parameters;

determine a type of a disturbance based upon the pattern; and

compare the pattern to at least one predetermined pattern associated with at least one of a step disturbance and an impulse disturbance.

22. The apparatus of claim 21 , wherein the disturbance analysis unit is configured to compare the pattern to at least one threshold associated with the at least one predetermined pattern.

23. The apparatus of claim 21 , wherein the disturbance analysis unit is configured to select the step disturbance or the impulse disturbance based on the comparison.

24. The apparatus of claim 23 , wherein the disturbance analysis unit is configured to track the step disturbance in response to selecting the step disturbance.

25. The apparatus of claim 23 , wherein the disturbance analysis unit is configured to reject data associated with the impulse in response to selecting the impulse disturbance.