IP Library Patent Application 11155008
Patent Application
App. No. 11/155,008

Method and apparatus for fluid processing and drying a workpiece

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Quick Facts
Patent No.
US None
App. No.
11/155,008
Abstract

A method and apparatus for fluid processing a workpiece are described. A gas can be used to agitate a fluid to improve cleaning and/or rinsing of a workpiece surface. The gas can reduce surface tension of the fluid to promote improved contact of the fluid with a surface of the workpiece. The surface of the workpiece can be dried by flowing gas along a portion of the workpiece surface during or after draining of the fluid.

Claims (36)

1 . A method of fluid processing a workpiece, comprising:

providing the workpiece in a fluid disposed in a process module; and

agitating the fluid in the process module with a gas to facilitate contact of the fluid with a contaminant on a surface of the workpiece.

2 . The method of claim 1 further comprising flowing the gas through a micro-porous material to introduce the gas to the process module.

3 . The method of claim 1 further comprising removing the contaminant from the surface of the workpiece.

4 . The method of claim 1 wherein bubbles of gas agitate the fluid to reduce surface tension of the fluid.

5 . The method of claim 1 further comprising removing a portion of the fluid from the process module.

6 . The method of claim 1 further comprising performing a quick dump rinse to remove a portion of the fluid from the process module.

7 . The method of claim 1 further comprising drying the workpiece.

8 . An apparatus for fluid processing a workpiece, comprising:

a process module containing a fluid, the workpiece retained by a workpiece holder disposed in the fluid; and

a gas distributor disposed in a lower portion of the process module, the gas distributor introducing a gas into the process module to agitate the fluid to facilitate contact of the fluid with a contaminant on a surface of the workpiece.

9 . The apparatus of claim 8 wherein the gas distributor comprises a micro-porous material.

10 . The apparatus of claim 8 wherein the process module comprises a drain to remove a portion of the fluid from the process module.

11 . The apparatus of claim 10 wherein the gas distributor flows gas along the surface of the workpiece as the portion of the fluid is removed from the process module.

12 . A method of fluid processing a workpiece, comprising:

providing the workpiece in a fluid disposed in a process module;

flowing a gas through a micro-porous material; and

agitating the fluid in the process module with the gas to reduce surface tension of the fluid on a surface of the workpiece to facilitate contact of the fluid with a contaminant on the surface of the workpiece.

13 . An apparatus for fluid processing a workpiece, comprising:

a process module containing a fluid, the workpiece retained by a workpiece holder disposed in the fluid; and

a gas distributor comprising a micro-porous material disposed in a lower portion of the process module, the gas distributor introducing a gas into the process module to agitate the fluid to facilitate contact of the fluid with a contaminant on a surface of the workpiece.

14 . A method of drying a workpiece, comprising:

providing the workpiece in a fluid disposed in a process module;

removing at least a portion of the fluid from the process module such that the fluid is removed from a surface of the workpiece; and

introducing a flow of a room temperature gas along a portion of the surface of the workpiece to dry said surface.

15 . The method of claim 14 wherein the gas includes a laminar flow pattern.

16 . The method of claim 14 wherein the flow of the room temperature gas accelerates the evaporation of fluid from at least the portion of the surface of the workpiece.

17 . The method of claim 14 wherein the temperature of the gas is between about 15° C. and about 25° C.

18 . An apparatus for drying a workpiece, comprising:

a process module containing a fluid, the workpiece retained by a workpiece holder disposed in the fluid;

a drain to remove at least a portion of the fluid from the process module to thereby remove the fluid from a surface of the workpiece; and

a gas distributor disposed in a lower portion of the process module, the gas distributor introducing a room temperature gas that flows along a portion of the surface of the workpiece exposed by removing the fluid to dry said surface.

19 . The apparatus of claim 18 wherein the gas distributor comprises a micro-porous material.

20 . The apparatus of claim 18 wherein the gas includes a laminar flow pattern.

21 . The apparatus of claim 18 wherein the flow of the room temperature gas accelerates the evaporation of fluid from at least the portion of the surface of the workpiece.

Assignments (6)
RELEASE OF SECURITY INTEREST Recorded Oct 18, 2012
From: COMERICA BANK
To: NEXX SYSTEMS, INC.
Reel/Frame 029151/0161 →
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2011
From: HERCULES TECHNOLOGY GROWTH CAPITAL, INC.
To: NEXX SYSTEMS, INC., A DELAWARE CORPORATION
Reel/Frame 027182/0505 →
ASSIGNMENT OF PATENT SECURITY INTEREST Recorded Jun 28, 2010
From: NEXX SYSTEMS, INC.
To: COMERICA BANK
Reel/Frame 024599/0050 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 5, 2007
From: NEXX SYSTEMS, INC.
To: HERCULES TECHNOLOGY GROWTH CAPITAL, INC.
Reel/Frame 020064/0111 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 21, 2006
From: NEXX SYSTEMS PACKAGING LLC
To: NEXX SYSTEMS, INC.
Reel/Frame 017507/0280 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 9, 2005
From: WU, QUNWEI; KEIGLER, ARTHUR; LIU, ZHENQIU; HARRELL, JOHN; BOWLER, STEVE
To: NEXX SYSTEMS PACKAGING, LLC
Reel/Frame 016965/0877 →