Resistive semiconductor element based on a solid-state ion conductor

1. A nonvolatile, resistively switching memory cell, comprising:

a layer of a solid-state ion conductor arranged between a first electrode and a second electrode, wherein the solid-state ion conductor includes a nanoporous low-k dielectric and is free of chalcogenide glass, wherein the porosity of the dielectric is in the range of 1 to 50%, and wherein the dielectric includes ions of a metal from which one of the electrodes is formed.

2. The nonvolatile, resistively switching memory cell as claimed in claim 1 , wherein the dielectric is selected from the group consisting of: carbon-doped silicon dioxide, fluorinated silicate, silsesquioxane, and an aromatic organic dielectric.

3. The nonvolatile, resistively switching memory cell as claimed in claim 1 , wherein the porosity of the porous low-k dielectric is below the percolation threshold.

4. The nonvolatile, resistively switching memory cell as claimed in claim 1 , wherein the pore size of the porous dielectric is in the range from 1 to 10 nm.

5. The nonvolatile, resistively switching memory cell as claimed in claim 1 , wherein the first electrode is selected from the group consisting of tantalum, copper, aluminum, and silver.

6. The nonvolatile, resistively switching memory cell as claimed in claim 1 , wherein the second electrode is selected from the group consisting of gold, tungsten, titanium, titanium nitride, platinum, tantalum, tantalum nitride, carbon, W, TaW, WCN, WN, Ir,IrO, Ru, RuO, and SrRuO.

7. The nonvolatile, resistively switching memory cell as claimed in claim 1 , wherein the layer of a solid-state ion conductor is directly adjacent the first and second electrodes.

8. A nonvolatile, resistively switching memory cell, comprising:

an inert electrode;

a reactive electrode; and

a solid-state ion conductor layer arranged between the inert electrode and the reactive electrode, the solid-state ion conductor layer being switchable between a low-resistance state and a high-resistance state via application of suitable voltages to the reactive electrode that cause metal ions from the reactive electrode to reversibly diffuse into and out of the solid-state ion conductor layer, wherein the solid-state ion conductor layer comprises a nanoporous low-k dielectric and is free of chalcogenide glass and wherein the porosity of the nanoporous low-k dielectric is in the range of 1 to 50% and is below the percolation threshold.

9. The nonvolatile, resistively switching memory cell as claimed in claim 8 , wherein the layer of a solid-state ion conductor is directly adjacent the first and second electrodes.

10. The nonvolatile, resistively switching memory cell as claimed in claim 8 , wherein the nanoporous low-k dielectric comprises at least one of: carbon-doped silicon dioxide, fluorinated silicate, silsesquioxane, and an aromatic organic dielectric.

11. The nonvolatile, resistively switching memory cell as claimed in claim 8 , wherein the pore size of the nanoporous low-k dielectric is in the range from 1 to 10 nm.

12. The nonvolatile, resistively switching memory cell as claimed in claim 8 , wherein the reactive electrode comprises at least one of tantalum, copper, aluminum, and silver.

13. The nonvolatile, resistively switching memory cell as claimed in claim 8 , wherein the inert electrode comprises at least one of gold, tungsten, titanium, titanium nitride, platinum, tantalum, tantalum nitride, carbon, W, TaW, WCN, WN, Ir, IrO, Ru, RuO, and SrRuO.