Method and apparatus for classifying faults based on wafer state data and sensor tool trace data
View Patent ↗The present invention provides a method and apparatus for classifying faults. The method includes accessing wafer state data associated with at least one wafer processed by at least one processing tool and sensor tool trace data associated with the at least one processing tool and determining that at least one fault occurred based upon at least one of the wafer state data and the sensor tool trace data. The method also includes selecting, in response to determining that the at least one fault occurred, a subset of a plurality of faults based upon at least one of the wafer state data and the sensor tool trace data and selecting at least one fault from the subset of the plurality of faults based upon at least one of the wafer state data and the sensor tool trace data.
1. A method, comprising:
accessing wafer state data associated with at least one wafer processed by at least one processing tool and sensor tool trace data associated with the at least one processing tool;
determining that at least one fault occurred based upon at least one of the wafer state data and the sensor tool trace data;
selecting, in response to determining that the at least one fault occurred, a subset of a plurality of faults based upon at least one of the wafer state data and the sensor tool trace data; and
selecting at least one fault from the subset of the plurality of faults based upon at least one of the wafer state data and the sensor tool trace data.
2. The method of claim 1 , wherein determining that the at least one fault occurred based upon at least one of the wafer state data and the sensor tool trace data comprises determining whether the wafer state data is within an allowable range.
3. The method of claim 2 , wherein selecting the subset of a plurality of faults comprises selecting the subset of the plurality of faults based on the sensor tool trace data.
4. The method of claim 3 , wherein selecting the at least one fault from the subset of the plurality of faults comprises selecting the at least one fault from the subset of the plurality of faults based on the wafer state data.
5. The method of claim 1 , wherein determining that the at least one fault occurred based upon at least one of the wafer state data and the sensor tool trace data comprises determining that the at least one fault occurred based upon sensor tool trace data indicative of at least one fault.
6. The method of claim 5 , wherein selecting the subset of a plurality of faults comprises selecting the subset of the plurality of faults based on the wafer state data.
7. The method of claim 6 , wherein selecting the at least one fault from the subset of the plurality of faults comprises selecting the at least one fault from the subset of the plurality of faults based on the sensor tool trace data.