IP Library Granted Patent US 7,153,726
Granted Patent B2
US 7,153,726 · App. 11/215,374 · Granted Dec 26, 2006

Semiconductor device with magnetically permeable heat sink

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Quick Facts
Patent No.
US 7,153,726
App. No.
11/215,374
Granted
Dec 26, 2006
Kind
B2
Abstract

A semiconductor device is attached to a heat sink by glue that is both thermally conductive and magnetically permeable. The glue fills different features in the surface of the semiconductor device so that there is good coupling between the semiconductor device and the heat sink. The glue is filled with magnetic particles so that the glue is magnetically permeable. The semiconductor device is formed with the heat sink at the wafer level and then singulated after attachment of the heat sink with the glue.

Claims (27)

1. A method of making a semiconductor device comprising: providing an integrated circuit bearing structure with a first surface; selecting a substrate structure material having a first characteristic, the

first characteristic being at least one of the group consisting of thermally conductive, electrically conductive and magnetically permeable;

providing a substrate structure comprised of the selected substrate structure material, the substrate structure having a second surface; providing a glue having the first characteristic; and

gluing the integrated circuit bearing structure to the substrate structure using the glue.

2. The method of claim 1 wherein the step of providing the glue comprises:

providing a bonding agent; and

providing an amount of first characteristic enhancing agent; and mixing the bonding agent and the first characteristic enhancing agent.

3. The method of claim 1 wherein the step of gluing the integrated circuit bearing structure to the substrate structure comprises:

depositing the glue on at least one of the first and second surfaces;

placing the first and second surfaces in proximity with each other such that the glue extends between the first and second surfaces; and

curing the glue to bond the integrated circuit bearing structure to the substrate structure.

4. The method of claim 1 wherein the integrated circuit bearing structure is a wafer, the method comprising:

singulating a plurality of integrated circuits from the wafer, each of the integrated circuits comprising a portion of the wafer, the substrate and the glue.

5. The method of claim 1 further comprising:

selecting the substrate structure material to have a second characteristic, the second characteristic being another one of the group consisting of thermally conductive, electrically conductive and magnetically permeable.

6. The method of claim 1 wherein the integrated circuit bearing structure is a first integrated circuit bearing structure, the method further comprising:

providing a second integrated circuit bearing structure;

connecting the second integrated circuit bearing structure to the first integrated circuit bearing structure.

7. The method of claim 2 wherein the bonding agent is provided in liquid form and the first characteristic enhancing agent is provided in particulate form, and wherein the bonding agent and the first characteristic enhancing agent are mixed to provide a colloidal glue such that particles of the first characteristic enhancing agent are dispersed within a substantially continuous medium of the bonding agent.

8. A method of making a colloidal glue comprising:

selecting a characteristic from the group of thermally conductive, electrically conductive, and magnetically permeable; providing a glue having the selected characteristic; and

bonding an integrated circuit layer to a substrate layer using the glue haying the selected characteristic.

9. The method of claim 8 further comprising: thinning the integrated circuit layer after bonding.

10. The method of claim 8 further comprising: providing the substrate layer with the selected characteristic.

11. The method of claim 8 wherein the providing the glue comprises:

providing a base adhesive agent; and

adding a characteristic agent to the base adhesive to provide a glue having the selected characteristic in colloidal suspension.

Assignments (17)
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Feb 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 052917/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Jan 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 052915/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 037486 FRAME 0517. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Dec 10, 2019
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 053547/0421 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050744/0097 →
CORRECTIVE ASSIGNMENT TO CORRECT THE TO CORRECT THE APPLICATION NO. FROM 13,883,290 TO 13,833,290 PREVIOUSLY RECORDED ON REEL 041703 FRAME 0536. ASSIGNOR(S) HEREBY CONFIRMS THE THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS.. Recorded Feb 20, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: SHENZHEN XINGUODU TECHNOLOGY CO., LTD.
Reel/Frame 048734/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE PATENTS 8108266 AND 8062324 AND REPLACE THEM WITH 6108266 AND 8060324 PREVIOUSLY RECORDED ON REEL 037518 FRAME 0292. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Feb 1, 2017
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 041703/0536 →
CORRECTIVE ASSIGNMENT TO CORRECT THE NATURE OF CONVEYANCE LISTED CHANGE OF NAME SHOULD BE MERGER AND CHANGE PREVIOUSLY RECORDED AT REEL: 040652 FRAME: 0180. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER AND CHANGE OF NAME. Recorded Jan 12, 2017
From: FREESCALE SEMICONDUCTOR INC.
To: NXP USA, INC.
Reel/Frame 041354/0148 →
CHANGE OF NAME Recorded Nov 8, 2016
From: FREESCALE SEMICONDUCTOR INC.
To: NXP USA, INC.
Reel/Frame 040652/0180 →
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 040928/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 21, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 040925/0001 →
SUPPLEMENT TO THE SECURITY AGREEMENT Recorded Jun 16, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 039138/0001 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 13, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037518/0292 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 12, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037486/0517 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037356/0553 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037354/0225 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037356/0143 →
SECURITY AGREEMENT Recorded Nov 6, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 031591/0266 →