IP Library Granted Patent US 7,173,851
Granted Patent B1
US 7,173,851 · App. 11/252,461 · Granted Feb 6, 2007

3.5 transistor non-volatile memory cell using gate breakdown phenomena

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Quick Facts
Patent No.
US 7,173,851
App. No.
11/252,461
Granted
Feb 6, 2007
Kind
B1
Abstract

A programmable memory cell formed useful in a memory array having column bitlines and row wordlines. The memory cell including a breakdown transistor having its gate connected to a program wordline and a write transistor connected in series at a sense node to said breakdown transistor. The gate of the write transistor is connected to a write wordline. Further, a first sense transistor has its gate connected to the sense node. A second sense transistor is connected in series to the first sense transistor and has its gate connected to a read wordline. The second sense transistor has its source connected to a column bitline.

Claims (11)

1. A programmable memory cell formed useful in a memory array having column bitlines and row wordlines, the memory cell comprising:

a breakdown transistor having its gate connected to a program wordline;

a write transistor connected in series at a sense node to said breakdown transistor, said write transistor having its gate connected to a write wordline;

a first sense transistor having its gate connected to said sense node; and

a second sense transistor connected in series to said first sense transistor and having its gate connected to a read wordline, said second sense transistor having its source connected to a column bitline.

2. The memory cell of claim 1 wherein said write transistor has its source connected to a column sourceline.

3. The memory cell of claim 2 wherein said first sense transistor has its source connected to a column sourceline.

4. The memory cell of claim 1 wherein the drain of said first sense transistor is connected to the source of said second sense transistor.

5. The memory cell of claim 1 wherein said breakdown transistor is replaced with a MOS capacitor or polysilicon-oxide-semiconductor capacitor and said program wordline is connected to a polysilicon or metal layer of said capacitor.

6. The memory cell of claim 1 wherein said memory cell is programmed by applying a program voltage VPP to said program wordline and turning on said write transistor to allow programming current to flow through said breakdown transistor and onto a column sourceline.

7. The memory cell of claim 1 wherein said memory cell is read by turning off said write transistor, applying a read voltage VRD onto said program wordline and VDD to the gate of the second sense transistor, wherein said column bitline will have a decreasing voltage if said memory cell is programmed and a stable voltage if said memory cell is not programmed.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 4, 2018
From: KILOPASS TECHNOLOGY, INC.
To: SYNOPSYS, INC.
Reel/Frame 046099/0269 →
SECURITY INTEREST Recorded Aug 30, 2016
From: KILOPASS TECHNOLOGY, INC.
To: STRUCTURAL CAPITAL INVESTMENTS II, LP
Reel/Frame 039884/0004 →
CORRECTIVE ASSIGNMENT TO CORRECT ASSIGNEE'S NAME AND ADDRESS, PREVIOUSLY RECORDED ON 10/18/05 AT REEL 017121/FRAME 0447 Recorded Jul 12, 2006
From: CALLAHAN, JOHN M.; VERNENKER, HEMANSHU T.; FLIESLER, MICHAEL D.; ROSENDALE, GLEN A.; LUAN, HARRY S.; LIU, ZHONGSHANG
To: KILOPASS TECHNOLOGY, INC.
Reel/Frame 018092/0581 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 18, 2005
From: CALLAHAN, JOHN M.; VERNENKER, HEMANSHU T.; FLIESLER, MICHAEL D.; ROSENDALE, GLEN A.; LUAN, HARRY S.; LIU, ZHONGSHANG
To: KILOPASS TECHNOLOGIES, INC.
Reel/Frame 017121/0447 →