Method of manufacturing a phase change RAM device utilizing reduced phase change current
View Patent ↗To effectively lower the current required for changing a phase of a phase change layer in a phase change RAM device, metal pads are formed on a semiconductor substrate, and an oxide layer is formed on the metal pads. Nano-sized copolymer patterns aligned with the metal pads covered by the oxide layer are formed on the oxide layer. The oxide layer is etched to form oxide layer patterns by using the nano-sized copolymer patterns as barrier. The nano-sized copolymer patterns are then removed. A nitride layer is deposited and then etched to expose the oxide layer patterns. The exposed oxide layer patterns are removed to form nano-sized holes exposing the metal pads. Bottom electrodes are then formed in the nano-sized holes. A phase change layer and a top electrode are formed on each of the bottom electrodes.
1. A method of manufacturing a phase change RAM device, the method comprising the steps of:
i) forming a plurality of metal pads on a semiconductor substrate;
ii) forming an oxide layer on the semiconductor substrate covering the metal pads formed on the semiconductor substrate;
iii) forming a plurality of nano-sized copolymer patterns, each having diblock copolymer, on the oxide layer such that each nano-sized copolymer pattern is aligned above one of the metal pads;
iv) etching the oxide layer by using the nano-sized copolymer patterns as an etching barrier thus forming a plurality of oxide layer patterns;
v) removing the nano-sized copolymer patterns;
vi) depositing a nitride layer on the resultant semiconductor substrate covering the metal pads and the oxide layer patterns;
vii) etching the nitride layer exposing at least the top surface of each of the oxide layer patterns;
viii) removing the oxide layer patterns to form a plurality of nano-sized holes exposing the metal pads through the nano-sized holes;
ix) filling the nano-sized holes with a conductive material to form a plurality of nano-sized plug type bottom electrodes; and
x) forming a phase change layer on each of the plug type bottom electrodes and a top electrode on the phase change layer.
2. The method of claim 1 , wherein the diblock copolymer consists of polystyrene and polymethyl Methacrylate.
3. The method of claim 1 , wherein the oxide layer is etched by using CHF 3 and Ar gas.
4. The method of claim 1 , wherein the nitride layer is deposited through a chemical vapor deposition process or an atomic layer deposition process.
5. The method of claim 1 , wherein the nitride layer is etched through performing a reaction ion etching process using CHF 3 , CF 4 , CH 2 F 6 and Ar gas.
6. The method of claim 1 , wherein the oxide layer is removed by a wet etching process using a diluted HF solution.
7. The method of claim 1 , wherein the bottom electrode is made from one of TiN, TiW, Al, Cu and WSi.
8. The method of claim 1 , wherein the phase change layer is made from one of: Ge—Sb—Te; Ge—Bi—Te; Sb—Te doped with at least one of Ag, In, and Bi; and Bi—Te doped with at least one of Ag, In and Sn.
9. The method of claim 1 , wherein the top electrode is made from one of Al, Ti, Ta, TaSiN, TaN, Ru, TiW, and TiAlN.