Semiconductor device and method for fabricating thereof
View Patent ↗A silicon nitride film, which is a second hard mask, is dry etched to be removed completely. The silicon nitride film, which is formed on a sidewall of a silicon nitride film used as a first hard mask, has a relatively low etching rate. Therefore, if the silicon nitride film is continued etching until the corresponding portion thereof is removed, polysilicon is etched in a direction of depth in trench shape. Then, floating gates in adjacent cells are separated and a step portion of the polysilicon is formed. Consequently, a remaining portion of the silicon nitride film used as the first hard mask is removed, an ONO film is laminated on a whole surface of the poly silicon having the step portion on an edge that has been etched, and then, a polysilicon for a control gate is laminated on the ONO film.
1. A semiconductor device comprising:
a semiconductor substrate; and
a cell region having a tunnel oxide film, a floating gate, a dielectric film and a control gate that are laminated in this order on the semiconductor substrate, the floating gate including a sidewall having a step formed from a single material on which the dielectric film is provided, wherein the sidewall of the floating gate has a plurality of steps on which the dielectric film is provided, wherein the step portions are provided as successively inward of the sidewall in the direction from the bottom of the floating gate to the top thereof wherein the steps are provided at intervals approximately equal to h/(n+1) where n is the number of steps and h is the height of the sidewall of the floating gate and wherein the steps are of equal length.
2. The semiconductor device as claimed in claim 1 , wherein the floating gate comprises one of polysilicon and amorphous silicon.
3. The semiconductor device as claimed in claim 1 , wherein the floating gate is doped with phosphorus.
4. The semiconductor device as claimed in claim 1 , wherein the dielectric film comprises one of an ON film having a silicon oxide film and a silicon nitride film laminated in this order and an ONO film having a silicon oxide film, a silicon nitride film and another silicon oxide film laminated in this order.