Substrate processing apparatus and substrate processing method
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. An exposure device is arranged adjacent to the interface block. A resist film is formed on a substrate in the resist film processing block. A resist cover film is formed on the resist film in the resist cover film processing block before the substrate is subjected to exposure processing by the exposure device.
1. A substrate processing apparatus that is arranged adjacent to an exposure device, comprising:
a processing section for applying processing to a substrate; and
an interface that is provided on one end of said processing section for exchanging the substrate between said processing section and said exposure device, wherein
said interface includes a transport device that transports the substrate between said processing device, and
said processing section includes:
a first processing unit that forms a photosensitive film made of a photosensitive material on the substrate;
a second processing unit that forms a protective film for protecting said photosensitive film on the substrate before exposure processing by said exposure device;
a third processing unit that applies development processing to the substrate after the exposure processing by said exposure device;
a first processing block that includes said first processing unit, a first thermal processing unit that thermally treats the substrate, and a first transport unit that transports the substrate;
a second processing block that includes said second processing unit, a second thermal processing unit that thermally treats the substrate, and a second transport unit that transports the substrate; and
a third processing block that includes said third processing unit, a third thermal processing unit that thermally treats the substrate, and a third transport unit that transports the substrate; and
said transport device includes a transport mechanism configured to receive the substrate from and transfer the substrate to said exposure device, wherein
said transport mechanism has a first holder configured to hold and transport the substrate before the exposure processing by said exposure device, and a second holder configured to hold and transport the substrate after the exposure processing by said exposure device, and
said second holder is provided below said first holder.
2. The substrate processing apparatus according to claim 1 , wherein
said processing section further comprises a fourth processing unit that removes said protective film after the exposure processing by said exposure device and before the development processing by said third processing unit.
3. The substrate processing apparatus according to claim 2 , wherein
said processing section further comprises:
a fourth processing block that includes said fourth processing unit and a fourth transport unit that transports the substrate.
4. The substrate processing apparatus according to claim 1 , wherein said third processing block is arranged adjacent to said interface.
5. The substrate processing apparatus according to claim 1 , wherein said protective film made of flouroresin.
6. The substrate processing apparatus according to claim 1 , wherein
said interface further includes a fifth processing unit that applies given processing to the substrate and a platform on which the substrate is temporarily mounted,
said transport device further includes:
a fifth transport unit that transports the substrate between said processing section, said fifth processing unit, and said platform; and
said transport mechanism includes a sixth transport unit that transports the substrate between said platform and said exposure device.
7. The substrate processing apparatus according to claim 6 , wherein
said fifth transport unit has a third holder configured to hold and transport the substrate before the exposure processing by said exposure service, and
a fourth holder configured to hold and transport the substrate after the exposure processing by said exposure device.
8. The substrate processing apparatus according to claim 7 , wherein said fourth holder is provided below said third holder.
9. The substrate processing apparatus according to claim 6 , wherein
said fifth processing unit includes an edge exposure unit that subjects a peripheral portion of the substrate to exposure.
10. A substrate processing method for processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device, and comprises a first processing unit, a second processing unit, a third processing unit, and a fourth processing unit, the method comprising the steps of:
forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device;
forming a protective film for protecting said photosensitive film on the substrate by said second processing unit before the exposure processing by said exposure device;
holding the substrate before the exposure processing by said exposure device by a first holder of a transport mechanism to transport the substrate to said exposure device;
holding the substrate after the exposure processing by said exposure device by a second holder provided below said first holder of said transport mechanism, to transport the substrate from said exposure device;
applying development processing to the substrate by said third processing unit after the exposure processing by said exposure device; and
removing said protective film by said fourth processing unit after the exposure processing by said exposure device and before the development processing by said third processing unit.