Photoresist compositions
View Patent ↗Chemically-amplified positive photoresist compositions are provided that contain a resin that comprises acetal and alicyclic groups. Photoresists of the invention can exhibit notably enhanced lithographic properties. Preferred photoresists of the invention comprise one or more photoacid generator compounds and one or more phenolic resins comprise one or more photoacid-labile acetal groups and one or more alicyclic groups such as adamantyl.
1. A photoresist composition comprising:
i) one or more photoacid generator compounds,
ii) one or more resins that comprise a structure of the following Formula (I):
wherein:
R is a non-hydrogen substituent;
R 1 is a non-hydrogen substituent that does not include a hydroxy or carboxy group;
Acetal/Alicyclic is a substituent that includes both i) one or more photoacid-labile acetal groups and ii) one or more alicyclic groups;
each Z is independently hydrogen or optionally substituted C 1-6 alkyl;
m is an integer of from 0 to 4; n is an integer of from 0 to 5; w, x and y are mole percents of the respective polymer units based on total units of the polymer and each of w, x and y are greater than zero.
2. The photoresist composition of claim 1 wherein the Acetal/Alicyclic substituent comprises one or more adamantyl groups.
3. The photoresist composition of claim 1 wherein the Acetal/Alicyclic substituent comprise one or more ester moieties and one or more photoacid-labile acetal groups.
4. The photoresist composition of claim 2 wherein the Acetal/Alicyclic substituent comprise one or more ester moieties and one or more photoacid-labile acetal groups.
5. The photoresist composition of claim 1 wherein the one or more resins comprise a structure corresponding to the following Formula (II):
wherein:
Acetal/Alicyclic is a substituent that includes both i) one or more photoacid-labile acetal groups and ii) one or more alicyclic groups;
each Z is independently hydrogen or optionally substituted C 1-6 alkyl; and
each of w, x and y are greater than zero.
6. The photoresist composition of claim 5 wherein the Acetal/Alicyclic substituent comprises one or more adamantyl groups.
7. The photoresist composition of claim 5 wherein the Acetal/Alicyclic substituent comprise one or more ester moieties and one or more photoacid-labile acetal groups.
8. The photoresist composition of claim 6 wherein the Acetal/Alicyclic substituent comprise one or more ester moieties and one or more photoacid-labile acetal groups.
9. The photoresist composition of claim 1 wherein the one or more resins comprise a structure corresponding to the following Formula (III):
wherein:
each Z is independently hydrogen or optionally substituted C 1-6 alkyl;
each of w, x and y are greater than zero;
B is a chemical bond or a branched optionally substituted alkyl group;
C is an acetal group optionally linked together with a straight chained or branched optionally substituted alkyl and
Alicyclic is a carbon alicyclic group having 1, 2, 3 or 4 or more fused or otherwise covalently linked rings.
10. The photoresist composition of claim 9 wherein the Alicyclic substituent comprises an adamantyl group.
11. A method for treating a substrate, comprising:
applying a layer of a photoresist composition of claim 1 on a substrate surface; and
exposing the photoresist layer to patterned radiation and developing the exposed photoresist composition layer.
12. The method of claim 11 wherein the photoresist layer is exposed to radiation having a wavelength of 248 nm.
13. A method for treating a substrate, comprising:
applying a layer of photoresist composition of claim 5 on a substrate surface; and
exposing the photoresist layer to patterned radiation and developing the exposed photoresist composition layer.
14. An article of manufacture comprising a substrate having coated thereon a photoresist composition of claim 1 .
15. The article of claim 14 wherein the substrate is a micro electronic semiconductor wafer substrate.