Substrate processing apparatus and method
View Patent ↗Pure water dissolving nitrogen gas and containing microbubbles is supplied to a substrate. Since microbubbles are very minute in size and also have the electrostatic property, they can efficiently adsorb particles on the substrate surface or in the pure water. Further, since pure water dissolving nitrogen gas is unlikely to be charged, the pure water itself never carries new particles from each component of the apparatus. These functions allow efficient particle removal from the substrate surface or the liquid.
1. A substrate processing apparatus for processing a substrate using a liquid, said substrate processing apparatus comprising:
a processing bath for retaining a liquid, said processing bath having a bottom surface including at least two opposite sides;
a pair of discharge ports provided at the opposite sides of the bottom surface of said processing bath;
a holder for holding a substrate being immersed in the liquid in said processing bath;
a liquid supplier for supplying the liquid from the pair of discharge ports provided at the sides of the bottom surface of said processing bath to the inside of said processing bath and forming an upwardly directed liquid flow in said processing bath;
a propagation bath provided under said processing bath for retaining a propagation liquid, said propagation bath having a bottom surface including a back side;
an ultrasonic vibration applicator provided at the back side of the bottom surface of said propagation bath for applying ultrasonic vibrations to the liquid retained in said processing bath through said propagation bath;
a microbubble generator for generating microbubbles in the liquid supplied from said liquid supplier to said processing bath; and
a controller for controlling each of the above parts to stop the application of ultrasonic vibrations and continue only the supply of the liquid containing microbubbles after a predetermined duration of the application of ultrasonic vibrations and the supply of the liquid containing microbubbles to said substrate being immersed in the liquid retained in said processing bath.
2. The substrate processing apparatus according to claim 1 , further comprising:
a gas dissolver for dissolving a predetermined gas in the liquid supplied from said liquid supplier to said processing bath.
3. The substrate processing apparatus according to claim 2 , wherein
said gas dissolver dissolves nitrogen gas in the liquid supplied from said liquid supplier to said processing bath.