Chemical vapor deposition apparatus and electrode plate thereof
The vapor deposition apparatus has an electrode plate, which is capable of being easily produced, reducing a production cost and enhancing the ionization efficiency of the reactants. The chemical vapor deposition apparatus comprises a processing chamber and the electrode plate provided in the processing chamber, reactants are spouted from the electrode plate toward the work piece with applying radio frequency energy between the electrode plate and the work piece so as to produce plasma there between to process the work piece. The electrode plate has a plate proper including a plurality of gas spouts, which run through the plate proper in the thickness direction thereof, and the gas spouts are opened in inner bottom faces of any grooves, which are formed in a surface of the plate proper facing the work piece and extended to linearly transect the plate proper.
1 . A chemical vapor deposition apparatus comprising a processing chamber and an electrode plate being provided in said processing chamber, wherein a work piece is provided in said processing chamber to face said electrode plate parallel, reactants are spouted from said electrode plate toward the work piece with applying radio frequency energy between said electrode plate and the work piece so as to produce plasma there between to process the work piece, said chemical vapor deposition apparatus being characterized in,
That said electrode plate has a plate proper including a plurality of gas spouts, which run through the plate proper in the thickness direction thereof, and
That the gas spouts are opened in inner bottom faces of any grooves, which are formed in a surface of the plate proper facing the work piece and extended to linearly transect the plate proper.
2 . The apparatus according to claim 1 ,
wherein a planar arrangement of the gas spouts in the plate proper is realized and
all of the grooves are mutually arranged parallel.
3 . The apparatus according to claim 1 ,
wherein a planar arrangement of the gas spouts in the plate proper is realized and
the grooves are divided into three groups, in each of which the grooves are arranged parallel and which are mutually crossed at crossing angles of 60 degrees.
4 . The apparatus according to claim 1 ,
wherein a planar arrangement of the gas spouts in the plate proper is realized and
the grooves are divided into two groups, in each of which the grooves are arranged parallel and which are mutually crossed at crossing angles of 90 degrees.
5 . The electrode plate of the apparatus of according to claim 2 ,
wherein a planar arrangement of the gas spouts in the plate proper is realized and
all of the grooves are mutually arranged parallel.
6 . The electrode plate of the apparatus of according to claim 3 ,
wherein a planar arrangement of the gas spouts in the plate proper is realized and
the grooves are divided into three groups, in each of which the grooves are arranged parallel and which are mutually crossed at crossing angles of 60 degrees.
7 . The electrode plate of the apparatus of according to claim 4 ,
wherein a planar arrangement of the gas spouts in the plate proper is realized and
the grooves are divided into two groups, in each of which the grooves are arranged parallel and which are mutually crossed at crossing angles of 90 degrees.
8 . The electrode plate of the apparatus of according to claim 5 ,
wherein each of the grooves has a tapered sectional shape, in which a width of an open end is greater than that of an inner end.
9 . The electrode plate of the apparatus of according to claim 6 ,
wherein each of the grooves has a tapered sectional shape, in which a width of an open end is greater than that of an inner end.
10 . The electrode plate of the apparatus of according to claim 7 ,
wherein each of the grooves has a tapered sectional shape, in which a width of an open end is greater than that of an inner end.
11 . The electrode plate of the apparatus of according to claim 5 ,
wherein each of the grooves has an inverse tapered sectional shape, in which a width of an open end is smaller than that of an inner end.
12 . The electrode plate of the apparatus of according to claim 6 ,
wherein each of the grooves has an inverse tapered sectional shape, in which a width of an open end is smaller than that of an inner end.
13 . The electrode plate of the apparatus of according to claim 7 ,
wherein each of the grooves has an inverse tapered sectional shape, in which a width of an open end is smaller than that of an inner end.