Method and apparatus for laser marking by ablation
View Patent ↗A precision, laser-based method and system for high-speed, sequential processing of material of targets within a field are disclosed that control the irradiation distribution pattern of imaged spots. For each spot, a laser beam is incident on a first anamorphic optical device and a second anamorphic optical device so that the beam is controllably modified into an elliptical irradiance pattern. The modified beam is propagated through a scanning optical system with an objective lens to image a controlled elliptical spot on the target. In one embodiment, the relative orientations of the devices along an optical axis are controlled to modify the beam irradiance pattern to obtain an elliptical shape while the absolute orientation of the devices controls the orientation of the elliptical spot.
1. A marking method of selectively processing target material with a precisely controlled laser ablation threshold, the method comprising:
generating with a narrow pulse laser system a laser beam along a propagation path;
controllably modifying the laser beam to obtain a modified laser beam; and
sequentially and relatively positioning the modified laser beam into a plurality of well-focused spots extending along a series of parallel lines to process the target material wherein each of the well-focused spots is an elongated spot having a major axis and a minor axis wherein the major axis of each of the spots is aligned with one of the lines and wherein a precisely controlled ablation threshold allows for selective material processing and wherein each of the well-focused spots has a set of desired spatial characteristics which are obtained by the step of controllably modifying.
2. The method as claimed in claim 1 , wherein the set includes an aspect ratio greater than 1.
3. The method as claimed in claim 2 , wherein the aspect ratio is greater than about 2.
4. The method as claimed in claim 1 , wherein the narrow pulse laser system is a picosecond laser system.
5. The method as claimed in claim 1 , wherein the narrow pulse laser system is a femtosecond laser system.
6. The method as claimed in claim 1 , wherein the step of positioning is performed with a combination of at least one stage for translating the target material, and at least one rotating mirror for directing the beam.
7. The method as claimed in claim 1 , wherein each of the spots has a predetermined non-round energy distribution with a top hat along the major axis and a Gausian along the minor axis substantially orthogonal to the major axis.
8. A marking system for selectively processing target material with a precisely controlled laser ablation threshold, the system comprising:
a narrow pulse laser source for generating a laser beam along a propagation path;
a controller for generating control signals;
a subsystem for controllably modifying the laser beam in response to the control signals to obtain a modified laser beam; and
a beam delivery and focusing subsystem for sequentially and relatively positioning the modified laser beam into a plurality of well-focused spots extending along a series of parallel lines to process the target material wherein each of the well-focused spots is an elongated spot having a major axis and a minor axis wherein the major axis of each of the spots is aligned with one of the lines and wherein a precisely controlled ablation threshold allows for selective material processing and wherein each of the well-focused spots has a set of desired spatial characteristics.
9. The system as claimed in claim 8 , wherein the set includes an aspect ratio greater than 1.
10. The system as claimed in claim 9 , wherein the aspect ratio is greater than about 2.
11. The system as claimed in claim 8 , wherein the narrow pulse laser system is a picosecond laser system.
12. The system as claimed in claim 8 , wherein the narrow pulse laser system is a femtosecond laser system.
13. The system as claimed in claim 8 further comprising a combination of at least one stage for translating the target material and at least one rotating mirror for directing the beam.
14. The system as claimed in claim 8 , wherein each of the spots has a predetermined non-round energy distribution with a top hat along the major axis and a Gausian along the minor axis substantially orthogonal to the major axis.