IP Library Granted Patent US 7,683,378
Granted Patent B2
US 7,683,378 · App. 11/359,528 · Granted Mar 23, 2010

Light emitting diode and method for fabricating same

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Quick Facts
Patent No.
US 7,683,378
App. No.
11/359,528
Granted
Mar 23, 2010
Kind
B2
Abstract

An AlGaInP based light emitting diode is provided with a distributed Bragg reflector comprising a combination of an AlGaAs layer and an AlInP layer, each having a film thickness determined by following formulas (1) to (3): t 1 ={λ 0 /(4× n 1 )}×α  (1), t 2 ={λ 0 /(4× n 2 )}×(2−α)  (2), and 0.5<α<0.9  (3) wherein t 1 is a film thickness [nm] of the AlGaAs layer, t 2 is a film thickness [nm] of the AlInP layer, λ 0 is a wavelength [nm] of a light to be reflected, n 1 is a refractive index of the AlGaAs layer to the wavelength of the light to be reflected, and n 2 is a refractive index of the AlInP layer to the wavelength of the light to be reflected.

Claims (21)

1. A light emitting diode, comprising:

a first conductivity type substrate;

a first conductivity type distributed Bragg reflector comprising a multi-layered film which is made by alternately layering a high refractive index film comprising an AlGaAs layer comprising Al x Ga l-x As wherein an Al mixed crystal ratio x is 0<x<0.6, and a low refractive index film comprising an AlInP layer; and

a light emitting part comprising an active layer sandwiched between a first conductivity cladding layer and a second conductivity cladding layer, wherein:

a film thickness of each of the AlGaAs layer and AlInP layer making up the first conductivity type distributed Bragg reflector is determined by following formulas (1) to (3):

t 1 ={λ 0 /(4× n 1 )}×α  (1),

t 2 ={λ 0 /(4× n 2 )}×(2−α)  (2), and

0.5<α<0.9  (3)

wherein t 1 is a film thickness [nm] of the AlGaAs layer, t 2 is a film thickness [nm] of the AlInP layer, λ 0 is a wavelength [nm] of a light to be reflected by the Bragg reflector, n 1 is a refractive index of the AlGaAs layer to the wavelength of the light to be reflected by the Bragg reflector, and n 2 is a refractive index of the AlInP layer to the wavelength of the light to be reflected by the Bragg reflector.

2. The light emitting diode, according to claim 1 , wherein:

the first conductivity type distributed Bragg reflector is interposed between the first conductivity cladding layer and the first conductivity type substrate.

3. The light emitting diode, according to claim 1 , further comprising:

a second conductivity type current dispersion layer grown on the light emitting part.

4. The light emitting diode, according to claim 1 , wherein:

the first conductivity type substrate is composed of GaAs, and the light emitting part is composed of AlGaInP or GaInP.

5. The light emitting diode, according to claim 1 , further comprising:

a surface electrode provided as an uppermost layer; and

a backside electrode provided on a backside surface of the first conductivity type substrate.

6. The light emitting diode, according to claim 1 , wherein the light emitting diode is part of a lighting device or a display.

7. The light emitting diode, according to claim 5 , wherein the surface electrode comprises a circular partial electrode.

8. The light emitting diode, according to claim 5 , wherein the backside electrode comprises an n-side metal electrode.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 2, 2016
From: SCIOCS COMPANY LIMITED
To: SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 037869/0437 →
CORPORATE SEPARATION Recorded Jul 29, 2015
From: HITACHI METALS, LTD.
To: SCIOCS COMPANY LIMITED
Reel/Frame 036206/0031 →
MERGER Recorded Jan 29, 2014
From: HITACHI CABLE, LTD.
To: HITACHI METALS, LTD.
Reel/Frame 032134/0723 →