IP Library Granted Patent US 7,442,925
Granted Patent B2
US 7,442,925 · App. 11/370,006 · Granted Oct 28, 2008

Working method using scanning probe

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Quick Facts
Patent No.
US 7,442,925
App. No.
11/370,006
Granted
Oct 28, 2008
Kind
B2
Abstract

The present invention provides a working method using a scanning probe which can enhance a working speed and prolong a lifetime of the probe. The present invention provides the working method using a scanning probe which works a sample by performing the relative scanning of a probe supported on a cantilever on the sample at a predetermined scanning speed. The working method can work the object to be worked while forcibly and relatively vibrating the probe in the direction orthogonal to or parallel to a working surface of the sample at low frequency of 100 to 1000 Hz.

Claims (23)

1. A working method using a scanning probe which works an object to be worked by performing relative scanning of a probe which is supported on a distal end of a cantilever on the object to be worked at a predetermined speed, wherein

the probe works the object to be worked in a state that the probe is forcibly and relatively vibrated in the direction orthogonal to a working surface of the object to be worked at low frequency of 100 to 1000 Hz.

2. A working method using a scanning probe according to claim 1 , wherein the probe works the object to be worked in a state that the probe is forcibly and relatively vibrated in the direction parallel to a working surface of the object to be worked at low frequency of 100 to 1000 Hz.

3. A working method using a scanning probe according to claim 1 , wherein the object to be worked is worked by setting an amplitude when the probe is forcibly and relatively vibrated at low frequency to a value which falls within a range of 5 to 2000 nm.

4. A working method using a scanning probe according to claim 1 , wherein the object to be worked is worked in a state that the probe is forcibly and relatively vibrated at low frequency and, at the same time, the object to be worked is relatively resonated at frequency higher than the low frequency in the direction orthogonal to a working surface of the object to be worked.

5. A working method using a scanning probe according to claim 1 , wherein the object to be worked is worked in a state that the probe is forcibly and relatively vibrated at low frequency and, at the same time, the object to be worked is relatively resonated at frequency higher than the low frequency in the direction parallel to a working surface of the object to be worked.

6. A working method using a scanning probe which works an object to be worked by performing relative scanning of a probe which is supported on a distal end of a cantilever on the object to be worked at a predetermined speed, wherein

the probe works the object to be worked in a state that the probe is forcibly and relatively vibrated in the direction parallel to a working surface of the object to be worked at low frequency of 100 to 1000 Hz.

7. A working method using a scanning probe according to claim 6 , wherein the object to be worked is worked by setting an amplitude when the probe is forcibly and relatively vibrated at low frequency to a value which falls within a range of 5 to 2000 nm.

8. A working method using a scanning probe according to claim 6 , wherein the object to be worked is worked in a state that the probe is forcibly and relatively vibrated at low frequency and, at the same time, the object to be worked is relatively resonated at frequency higher than the low frequency in the direction orthogonal to a working surface of the object to be worked.

9. A working method using a scanning probe according to claim 6 , wherein the object to be worked is worked in a state that the probe is forcibly and relatively vibrated at low frequency and, at the same time, the object to be worked is relatively resonated at frequency higher than the low frequency in the direction parallel to a working surface of the object to be worked.

10. A working method using a scanning probe which works an object to be worked by performing relative scanning of a probe which is supported on a distal end of a cantilever on the object to be worked at a predetermined speed, wherein

the probe is fixed at a predetermined working height from a reference surface of the object to be worked, and the object to be worked is worked by scanning the probe in the X direction or in the Y direction parallel to a working surface of the object to be worked.

11. A working method using a scanning probe according to claim 10 , wherein the object to be worked is worked in a state that the probe is forcibly and relatively vibrated in the direction orthogonal to the working surface of the object to be worked at low frequency of 100 to 1000 Hz.

12. A working method using a scanning probe according to claim 11 , wherein the object to be worked is worked by setting an amplitude when the probe is forcibly and relatively vibrated at low frequency to a value which falls within a range of 5 to 2000 nm.

13. A working method using a scanning probe according to claim 11 , wherein the object to be worked is worked in a state that the probe is forcibly and relatively vibrated at low frequency and, at the same time, the object to be worked is relatively resonated at frequency higher than the low frequency in the direction orthogonal to a working surface of the object to be worked.

14. A working method using a scanning probe according to claim 10 , wherein the object to be worked is worked in a state that the probe is forcibly and relatively vibrated in the direction parallel to the working surface of the object to be worked at low frequency of 100 to 1000 Hz.

15. A working method using a scanning probe according to claim 14 , wherein the object to be worked is worked by setting an amplitude when the probe is forcibly and relatively vibrated at low frequency to a value which falls within a range of 5 to 2000 nm.

16. A working method using a scanning probe according to claim 14 , wherein the object to be worked is worked in a state that the probe is forcibly and relatively vibrated at low frequency and, at the same time, the object to be worked is relatively resonated at frequency higher than the low frequency in the direction orthogonal to a working surface of the object to be worked.

17. A working method using a scanning probe according to claim 10 , wherein the object to be worked is worked in a state that the probe is forcibly and relatively vibrated in both directions orthogonal to and parallel to the working surface of the object to be worked at low frequency of 100 to 1000 Hz.

18. A working method using a scanning probe according to claim 17 , wherein the object to be worked is worked by setting an amplitude when the probe is forcibly and relatively vibrated at low frequency to a value which falls within a range of 5 to 2000 nm.

19. A working method using a scanning probe according to claim 10 , wherein the object to be worked is worked in a state that the probe is forcibly and relatively vibrated at low frequency and, at the same time, the object to be worked is relatively resonated at frequency higher than the low frequency in the direction orthogonal to a working surface of the object to be worked.

20. A working method using a scanning probe according to claim 10 , wherein the object to be worked is worked in a state that the probe is forcibly and relatively vibrated at low frequency and, at the same time, the object to be worked is relatively resonated at frequency higher than the low frequency in the direction parallel to a working surface of the object to be worked.

Assignments (2)
CHANGE OF NAME Recorded Sep 25, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033817/0078 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 1, 2006
From: YASUTAKE, MASATOSHI; NAKAUE, TAKUYA; WATANABE, KAZUTOSHI; TAKAOKA, OSAMU; UEMOTO, ATSUSHI; WATANABE, NAOYA; SHIKAKURA, YOSHITERU
To: SII NANOTECHNOLOGY INC.
Reel/Frame 017810/0764 →