Photo-patterned carbon electronics
View Patent ↗A system is provided for the manufacture of carbon based electrical components including, an ultraviolet light source; a substrate receiving unit whereby a substrate bearing a first layer of carbon based semiconductor is received and disposed beneath the ultraviolet light source; a mask disposed between the ultraviolet light source and the carbon based semiconductor layer; a doping agent precursor source; and environmental chemical controls, configured such that light from the ultraviolet light source irradiates a doping agent precursor and the first carbon layer.
1. A system for the manufacture of carbon based electrical components, the system comprising:
an ultraviolet light source;
a substrate receiving unit whereby a substrate bearing a first layer of carbon based semiconductor is received and disposed beneath said ultraviolet light source;
a mask disposed between said ultraviolet light source and said first layer of carbon based semiconductor;
a doping agent precursor source; and
environmental chemical controls configured such that light from said ultraviolet light source irradiates a doping agent precursor and said first carbon layer.
2. The system according to claim 1 wherein said ultraviolet light source emits light in a spectrum selected from the group of spectra consisting of Deep Ultraviolet Light and Extreme Ultraviolet Light.
3. The system according to claim 1 wherein said ultraviolet light source comprises a stepper laser.
4. The system according to claim 1 further comprising an optical component disposed between said mask and said first layer of carbon based semiconductor.
5. The system according to claim 4 wherein said optical component comprises at least one optical component selected from the group of optical components consisting of a lenses, arrays of lenses, diffraction gratings, optical wave guides, modified crystals, Liquid Crystal Displays, Spatial light modulators, prisms, interferimetric lithography, and mirrors.
6. The system according to claim 5 wherein said optical component is resistant to chemical attack.
7. The system according to claim 1 further comprising a docked coating tool communicating with said substrate receiving unit, whereby said substrate wafer is received and coated with said first carbon layer.
8. The system according to claim 7 wherein said docked coating tool is configured to provide at least a second carbon layer and reintroduce said substrate layer and said first carbon layer, together with said second carbon layer to said receiving unit.
9. The system according to claim 1 wherein said doping agent precursor source is a gas supply.
10. The system according to claim 1 wherein said doping agent precursor source is a condensed phase fluid configured to apply said doping agent precursor to said first carbon layer by spinning.
11. The system according to claim 1 wherein said doping agent precursor is selected from the group of doping agent precursors consisting of COF 2 , CF 2 Cl 2 , CF 2 Br 2 , CF 3 Br, CF 3 I, CF 3 NO, CO(CF 3 ), Cesium, Potassium, Hydrogen, Oxygen, Fluorine dimer, Chlorine dimer, and Iodine dimer.
12. The system according to claim 1 wherein said environmental chemistry controls are configured to substantially exclude non-selected doping agent precursors.
13. The system according to claim 1 wherein said system comprises components resistant to chemical attack.