Phase change RAM device
View Patent ↗Disclosed are a phase change RAM device and a method for fabricating a phase change RAM device, which can efficiently lower intensity of current required for changing a phase of a phase change layer. The method includes the steps of providing a semiconductor substrate formed with an insulating interlayer including a tungsten plug, forming a first oxide layer on the semiconductor substrate, forming a pad-type bottom electrode, which makes contact with the tungsten plug, in the first oxide layer, forming a second oxide layer on the first oxide layer including the bottom electrode, and forming a porous polystyrene pattern on the second oxide layer such that a predetermined portion of the second oxide layer corresponding to a center portion of the bottom electrode is covered with the porous polystyrene pattern.
1. A phase change RAM device comprising:
an insulating layer formed over a semiconductor substrate and including a conductive plug formed therein;
an oxide layer formed over the insulating layer;
a pad-type bottom electrode formed in the oxide layer and in contact with the conductive plug, wherein the pad-type bottom electrode has a height substantially equal to a height of the oxide layer;
a masking pattern formed over the bottom electrode so as to shield a center part of the pad-type bottom electrode and expose only a peripheral portion of the pad-type bottom electrode, such that a bottom surface of the masking pattern is above an upper surface of the oxide layer;
a phase change layer formed directly over the oxide layer and covering a top surface and a side surface of the masking pattern, so as to completely shield the masking pattern, and covering an entire exposed peripheral portion of the bottom electrode; and
a top electrode formed on and abutting the phase change layer.
2. The phase change RAM device as claimed in claim 1 , wherein the masking pattern includes an oxide layer.
3. The phase change RAM device as claimed in claim 1 , wherein the masking pattern includes a nano-sized masking pattern.
4. The phase change RAM device as claimed in claim 1 , wherein the top electrode is formed over an upper surface and a side surface of the phase change layer.