Method for forming a capacitor structure
View Patent ↗A method for forming a capacitor structure, according to which the following consecutive steps are executed: providing a substrate having on its surface contact pads and a dielectric mold provided with at least one trench leaving exposed the contact pads; forming a first conductive layer on side walls of the trench in a top region of the trench the conductive layer being without contact to the contact pads; depositing a first dielectric layer; depositing a second conductive layer on the contact pad and on the side walls of the trench; depositing a second dielectric layer; depositing a third conductive layer; and forming a vertical plug interconnecting the first conductive layer and the third conductive layer.
1. A method for forming an integrated circuit having a capacitor structure:
providing a substrate having a contact pad and a dielectric mold thereover, the dielectric mold comprising at least one trench therein, thereby leaving exposed the contact pad;
forming a first conductive layer on side walls of the trench in a top region of the trench, the conductive layer not contacting the contact pad;
forming a first dielectric layer over the first conductive layer;
forming a second conductive layer on the contact pad, and on the side walls of the trench over the first dielectric layer;
forming a second dielectric layer over the second conductive layer;
forming a third conductive layer over the second dielectric layer; and
electrically connecting the first conductive layer and the third conductive layer, wherein the forming of the first conductive layer comprises:
depositing the first conductive layer;
depositing a masking layer over the first conductive layer selectively in the top region of the trench, thereby not overlying a bottom region of the trench;
etching the first conductive layer in the bottom region of the trench; and
removing the masking layer.
2. The method according to claim 1 , wherein the masking layer is formed by a chemical deposition method, at least one chemical reactant of the chemical deposition method having a concentration, which is decreased in the trench in a direction towards the contact pad and is approximately zero in the bottom region.
3. A method for forming an integrated circuit having a capacitor structure:
providing a substrate having a contact pad and a dielectric mold thereover, the dielectric mold comprising at least one trench therein, thereby leaving exposed the contact pad;
forming a first conductive layer on side walls of the trench in a top region of the trench, the conductive layer not contacting the contact pad;
forming a first dielectric layer over the first conductive layer;
forming a second conductive layer on the contact pad, and on the side walls of the trench over the first dielectric layer;
forming a second dielectric layer over the second conductive layer;
forming a third conductive layer over the second dielectric layer; and
electrically connecting the first conductive layer and the third conductive layer,
wherein before the first dielectric layer is formed, an isotropic etching step enlarges a diameter of a bottom region of the trench.
4. The method according to claim 3 , wherein the first conductive layer is formed by a chemical deposition method, at least one chemical reactant of the chemical deposition method having a concentration, which is decreasing in the trench in a direction towards the contact pad and is approximately zero in the bottom region.
5. The method according to claim 3 , wherein before the second conductive layer is deposited the following steps are executed:
forming a sacrificial layer over the first dielectric layer, the sacrificial layer having a first thickness above the contact pad in the trench and a second thickness above the dielectric mold outside the trench, the first thickness being smaller than the second thickness;
anisotropically etching the sacrificial layer until the sacrificial layer is removed above the contact pad, thereby exposing the first dielectric layer overlying the contact pad in the trench; and
selectively etching the exposed first dielectric layer, thereby exposing the contact pad.
6. The method according to claim 5 , wherein the sacrificial layer is formed by a chemical deposition method, at least one chemical reactant of the chemical deposition method having a concentration, which is decreasing in the trench in a direction towards the contact pad and is approximately zero in the bottom region.
7. The method according to claim 3 , wherein the second conductive layer is removed from a top surface of the dielectric mold outside the trench.
8. The method according to claim 7 , wherein the second conductive layer is removed by a chemical polishing method.
9. The method according to claim 3 , wherein before the second conductive layer is deposited a further dielectric mold having a further trench is formed on top of the dielectric mold, the further trench being arranged vertically in line to the trench.
10. The method of claim 3 , wherein electrically connecting the first and third conductive layers comprises forming a vertical conductive plug that interconnects the first and third conductive layers.
11. The method according to claim 10 , wherein the vertical plug is formed through a further dielectric mold for connecting the first conductive layer and the third conductive layer.