Apparatus of inspecting defect in semiconductor and method of the same
View Patent ↗When size of a defect on an increasingly miniaturized pattern is obtained by defect inspection apparatus in the related art, a value is inconveniently given, which is different from a measured value of the same defect by SEM. Thus, a dimension value of a defect detected by defect inspection apparatus needs to be accurately calculated to be approximated to a value measured by SEM. To this end, size of the defect detected by the defect inspection apparatus is corrected depending on feature quantity or type of the defect, thereby defect size can be accurately calculated.
1. A defect inspection apparatus comprising:
an illumination unit for illuminating light to an object to be inspected,
a detection unit for detecting scattering light from the object to be inspected,
a signal processing unit for detecting a defect by processing a detection signal of the scattering light detected by the detection unit, and calculating size of the defect detected by the defect detection unit,
a size correction unit for correcting the size of the defect calculated by the size measuring unit depending on separately obtained information of feature quantity or type of the defect, and
a display unit for displaying information of a result processed by the signal processing unit,
wherein said signal processing unit further calibrating the size of the defect calculated by the calculating, by using a relationship between a size of a defect whose size is known and a size of the defect detected by the detecting unit and calculated by the signal processing unit.
2. The defect inspection apparatus according to claim 1 :
wherein the illumination unit obliquely irradiates light shaped linearly to a surface of the object to be inspected.
3. The defect inspection apparatus according to claim 1 :
wherein the illumination unit irradiates laser having a wavelength of less than 400 nm to the object to be inspected.
4. The defect inspection apparatus according to claim 1 :
wherein the detection unit includes a spatial filter for shielding scattering light from a repetitive pattern formed on the object to be inspected in the scattering light from the object to be inspected, and a sensor for detecting scattering light which was not shielded by the spatial filter.
5. The defect inspection apparatus according to claim 1 :
wherein the display unit displays information on positional information and size of a defect, a defect type, and criticality as the information of the result processed by the data processing unit.
6. The defect inspection apparatus according to claim 1 :
wherein the light detection unit includes a TDI sensor that outputs detection signals in parallel, and the defect detection unit processes the signals outputted in parallel from the TDI sensor in parallel.
7. The defect inspection apparatus according to claim 2 :
wherein the light detection unit includes a TDI sensor that outputs detection signals in parallel, and the defect detection unit processes the signals outputted in parallel from the TDI sensor in parallel.
8. A defect inspection method comprising steps of:
illuminating light to an object to be inspected,
detecting light scattered from the object to be inspected due to irradiation of the light,
detecting a defect by processing a detection signal of the scattered light,
calculating size of the detected defect,
correcting the size of the calculated defect by calibrating the calculated size of the defect using a relation between a size of a sample defect which is known and the size of the sample defect detected at the detecting step and calculated at the calculating step, and
displaying information relating to the corrected size of the defect on a screen.
9. The defect inspection method according to claim 8 :
wherein in the step of illuminating light to the object to be inspected, said light is shaped linearly and is obliquely irradiated to a surface of the object to be inspected.
10. The defect inspection method according to claim 8 :
wherein in the step of illuminating light to the object to be inspected, said light is a laser having a wavelength of less than 400 nm.
11. The defect inspection method according to claim 8 :
wherein in the step of detecting light scattered from the object, light scattered from repetitive patterns formed on the object is shielded by a special filter, and light scattered from the object and not shielded by the spatial filter is detected by a sensor.
12. The defect inspection method according to claim 8 :
wherein information on positional data and size of a defect, a defect type, and criticality is displayed as the information of the processed result.
13. The defect inspection method according to claim 8 :
wherein in the step of detecting the scattering light, the scattering light is detected by a TDI sensor that outputs detection signals in parallel, and in the step of detecting the defect, the signals outputted in parallel from the TDI sensor are processed in parallel.