Stripper for electronics
View Patent ↗Compositions and methods useful for the removal of polymeric material from substrates, such as electronic devices are provided. These compositions and methods are particularly suitable for removing polymer residues from electronic devices following plasma etch processes.
1. A composition for the removal of polymeric material from a substrate comprising: (a) 0.05 to 5% wt of a fluoride source; (b) 40 to 95% wt of a solvent mixture comprising a polyhydric alcohol and an ether; (c) 5 to 50% wt water; and (d) a pH adjuster chosen from (1) carbonic acid or its salt and (2) a polycarboxylic acid and a base where the molar ratio of the polycarboxylic acid to the base is 1:1 to 1:10; wherein the composition has a pH of 4 to 8.
2. The composition of claim 1 wherein the fluoride source is chosen from ammonium fluoride, ammonium bifluoride, tetraalkylammonium fluoride, ammonium-tetraalkylammonium bifluoride, and mixtures thereof.
3. The composition of claim 1 wherein the polycarboxylic acid has 3 carboxylic acid groups.
4. The composition of claim 1 wherein the polycarboxylic acid is chosen from citric acid, isocitric acid tartaric acid, oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, maleic acid, fumaric acid, phthalic acid, 4-(2-hydroxyethyl)piperazine-1-ethanesulfonic acid, L-glutamic acid, cis-aconitic acid, agaric acid, trans-aconitic acid, trimellitic acid and trimesic acid.
5. The composition of claim 1 wherein the base is chosen from alkyldiamines, imines, cyclic amines and alkanolamines.
6. The composition of claim 5 wherein the cyclic amine is chosen from morpholine, imidazole, morpholine, piperazine, 1,2-dimethylimidazole, 1-methylimidazole, L-Histidine, 4-(N-morpholino) butanesulfonic acid, 4-(N-morpholino)propanesulfonic acid, 3-morpholino-2-hydroxypropanesulfonic acid, and 1,8-diazabicyclo[5.4.0]undec-7-ene.
7. The composition of claim 1 wherein the pH is from 6 to 8.
8. The composition of claim 1 further comprising an additive chosen from corrosion inhibitors, surfactants, co-solvents, chelating agents, reducing agents and mixtures thereof.
9. A method of removing polymeric residue from a substrate comprising the step of contacting a substrate comprising polymeric residue with the composition of claim 1 for a period of time sufficient to remove the polymeric residue.
10. A composition for removing polymeric residue from a substrate comprising: (a) a fluoride source; (b) a solvent mixture comprising a polyhydric alcohol and an ether; (c) water; and (d) a pH adjuster chosen from (1) carbonic acid or its salt and (2) a polycarboxylic acid and a base where the molar ratio of the polycarboxylic acid to the base is 1:1 to 1:10; wherein the composition has a pH of 4 to 8.