Method and its apparatus for inspecting particles or defects of a semiconductor device
View Patent ↗Conventionally, a particle/defect inspection apparatus outputs a total number of detected particles/defects as the result of detection. For taking countermeasures to failures in manufacturing processes, the particles/defects detected by the inspection apparatus are analyzed. Since the inspection apparatus outputs a large number of detected particles/defects, an immense time is required for analyzing the detected particles/defects, resulting in a delay in taking countermeasures to a failure in the manufacturing processes. In the present invention, an apparatus for optically inspecting particles or defects relates a particle or defect size to a cause of failure in an inspection result. A data processing circuit points out a cause of failure from the statistics on the inspection result, and displays information on the inspection result. A failure analysis is conducted by setting a threshold for identifying a failure in each of regions on a semiconductor device or the like to statistically evaluate detected particles.
1. An apparatus for inspecting a specimen comprising:
illuminating means for illuminating a specimen with a light;
light detecting means for detecting light reflected from the specimen by the illumination with the light;
processing means for processing a signal output from the light detecting means so as to detect a defect;
defect classifying means for classifying the defect detected by the processing means;
defect size estimating means for estimating a size of the detected and classified defect; and
display means for displaying information on the estimated defect size,
wherein the defect size estimating means estimates the size of the defect by using a conversion curve which is set according to a class of the detected defect classified by the defect candidate classifying means or a position on the specimen where the defect is detected or a surface state of the specimen where the defect is detected.
2. An apparatus according to the claim 1 , wherein the display means displays a distribution of sizes of detected specimens.
3. An apparatus according to the claim 1 , wherein the surface state of the specimen to set the conversion curve for the estimation of the defect size by the defect size estimating means includes data on scattered light from the surface or reflectivity of the surface.
4. A method for inspecting a specimen comprising:
illuminating a specimen with a light;
detecting with a sensor a light reflected from the specimen by the illumination with the light;
processing a signal output from the sensor so as to detect a defect;
classifying the defect detected by the processing means;
estimating sizes of the detected and classified defects; and
displaying information on the estimated defect sizes,
wherein in the step of estimating, the size of the defect is estimated by using a conversion curve which is set according to a class of the defect classified by the classifying step or a position on the specimen where the defect is detected or a surface state of the specimen where the defect is detected.
5. A method according to the claim 4 , wherein in the step of displaying, a distribution of sizes of detected specimens is displayed.
6. A method according to the claim 4 , wherein in the step of estimating, the surface state of the specimen to set the conversion curve for the estimation of the defect size includes data on scattered light from the surface or reflectivity of the surface.