Non-volatile memory device and manufacturing method and operating method thereof
View Patent ↗A non-volatile memory device having a substrate, an n type well, a p type well, a control gate, a composite dielectric layer, a source region and a drain region is provided. A trench is formed in the substrate. The n type well is formed in the substrate. The p type well is formed in the substrate above the n type well. The junction of p type well and the n type well is higher than the bottom of the trench. The control gate which protruding the surface of substrate is formed on the sidewalls of the trench. The composite dielectric layer is formed between the control gate and the substrate. The composite dielectric layer includes a charge-trapping layer. The source region and the drain region are formed in the substrate of the bottom of the trench respectively next to the sides of the control gate.
1. A method for fabricating a non-volatile flash memory device, the method comprising:
providing a substrate;
forming a first conductive type first well region in the substrate;
forming a second conductive type second well region above the first conductive type first well region;
forming a trench in the substrate, wherein a depth of the trench is greater than a depth of the second conductive type second well region;
forming a composite dielectric layer at both sides of the trench, wherein the composite dielectric layer comprises a charge storage layer;
forming a pair of conductive spacers on sidewalls of the trench, wherein the composite dielectric layer is disposed between the conductive spacers and the sidewall of the trench; and
forming a source region and a pair of drain regions in the substrate, wherein the source region is formed in the substrate between two of the neighboring conductive spacers, and the drain regions are formed on two sides of the trench in the second conductive type second well region.
2. The method of claim 1 , wherein after the step of forming the source region and the drain regions in the substrate, the method further comprises:
forming an interlayer dielectric layer on the substrate to cover the substrate, the trench and the conductive spacers;
forming an opening in the interlayer dielectric layer, wherein the opening at least exposes the drain region; and
filling a conductive material into the opening to form a conductive plug.
3. The method of claim 2 , wherein in the step of forming the opening in the interlayer dielectric layer, the opening further exposes a part of the second conductive type second well region.
4. The method of claim 1 , wherein the step of forming the pair of conductive spacers on the sidewall of the trench further comprises:
forming a conductive layer on the substrate; and
performing an anisotropic etching process to remove a portion of the conductive layer.
5. The method of claim 4 , wherein the step of performing the anisotropic etching process to remove the portion of the conductive layer further comprises removing a portion of the composite dielectric layer.
6. The method of claim 1 , wherein a material constituting the charge storage layer comprises silicon nitride.
7. The method of claim 1 , wherein a material constituting the charge storage layer comprises polysilicon.