Methods of fabricating a barrier layer with varying composition for copper metallization
Various embodiments provide improved processes and systems that produce a barrier layer with decreasing nitrogen concentration with the increase of film thickness. A barrier layer with decreasing nitrogen concentration with film thickness allows the end of barrier layer with high nitrogen concentration to have good adhesion with a dielectric layer and the end of barrier layer with low nitrogen concentration (or metal-rich) to have good adhesion with copper. An exemplary method of depositing a barrier layer on an interconnect structure is provided. The method includes (a) providing an atomic layer deposition environment, (b) depositing a barrier layer on the interconnect structure with a first nitrogen concentration during a first phase of deposition in the atomic layer deposition environment. The method further includes (c) continuing the deposition of the barrier layer on the interconnect structure with a second nitrogen concentration during a second phase deposition in the atomic layer deposition environment.
1. A method of depositing a metallic barrier layer to line an etched interconnect structure in an atomic layer deposition system, comprising: depositing the metallic barrier layer to line the etched interconnect structure using atomic layer deposition, the etched interconnect structure being etched into a dielectric layer, wherein a nitrogen concentration of the metallic barrier layer decreases with an increasing film thickness, and wherein the nitrogen concentration of the metallic barrier layer is changed by varying a chemical composition of one or more process gases in a sequential pulsing of process gases, by varying durations of the sequential pulsing of process gases, or a combination of both, such that the nitrogen concentration of the metallic barrier layer is highest where the metallic barrier layer is in contact with the dielectric layer; and forming a copper layer over the metallic barrier layer, such that the nitrogen concentration of the metallic barrier layer is lowest where the metallic barrier layer is in contact with the copper layer.
2. The method of claim 1 , wherein the metallic barrier layer is deposited by performing sequential pulsing of a barrier metal precursor, a purging gas, a nitrogen-containing gas and the purging gas, wherein the nitrogen-containing gas reacts with the barrier metal precursor to form the metallic barrier layer.
3. The method of claim 2 , wherein a duration of the nitrogen-containing gas decreases with each cycle of the sequential pulsing.
4. The method of claim 2 , wherein the nitrogen-containing gas is plasmarized.
5. The method of claim 2 , wherein the purging gas is plasmarized.
6. The method of claim 2 , wherein the barrier metal precursor is selected from the list containing pentaethylmethylamino-tantalum (PEMAT), pentadiethylamino-tantalum (PDEAT), pentadimethylamino-tantalum (PDMAT), tertbutylimido-tris(diethylamido)-tantalum (TBTDET), tertbutylimido-tris(dimethylamido)-tantalum (TBTDMT), tertbutylimido-tris(ethylmethylamido)-tantalum (TBTEMT), and tantalum halides TaX 5 , wherein X is fluorine (F), bromine (Br) or chlorine (CO, and any and all derivatives thereof.
7. The method of claim 2 , wherein purging gas is one of helium (He), neon (Ne), argon (Ar), hydrogen (H 2 ), nitrogen (N 2 ), and combinations thereof.
8. The method of claim 2 , wherein the nitrogen-containing gas is selected from the list containing ammonia (NH 3 ), N 2 , NO, and N x H y , wherein x and y are integers.
9. The method of claim 1 , wherein the barrier metal in the barrier layer is selected from the group consisting of tantalum (Ta), titanium (Ti), tungsten (W), zirconium (Zr), hafnium (Hf), molybdenum (Mo), niobium (Nb), vanadium (V), ruthenium (Ru) and chromium (Cr).
10. The method of claim 1 , wherein the metallic barrier layer is deposited by performing sequential pulsing of a barrier metal precursor, a purging gas, a first nitrogen-containing gas and the purging gas, wherein the first nitrogen-containing gas reacts with the barrier metal precursor to form a first sub-layer of the metallic barrier layer with a first nitrogen concentration.
11. The method of claim 10 , wherein deposition of the first sub-layer of the metallic barrier layer is followed by performing sequential pulsing of the barrier metal precursor, the purging gas, a second nitrogen-containing gas and the purging gas, wherein the second nitrogen-containing gas reacts with the barrier metal precursor to form a second sub-layer of the metallic barrier layer with a second nitrogen concentration and the second nitrogen concentration is lower than the first nitrogen concentration.
12. The method of claim 1 , wherein the metallic barrier layer is deposited by performing sequential pulsing of a first barrier metal precursor, a purging gas, a nitrogen-containing gas and the purging gas, wherein the nitrogen-containing gas reacts with the first barrier metal precursor to form a first sub-layer of the metallic barrier layer with a first nitrogen concentration.
13. The method of claim 12 , wherein deposition of the first sub-layer of the metallic barrier layer is followed by performing sequential pulsing of a second barrier metal precursor, a purging gas, a nitrogen-containing reactant and the purging gas, wherein the nitrogen-containing gas reacts with the second barrier metal precursor to form a second sub-layer of the metallic barrier layer with a second nitrogen concentration, and wherein the second nitrogen concentration is lower than the first nitrogen concentration.
14. The method of claim 1 , wherein the metallic barrier layer is deposited by performing sequential pulsing of a first barrier metal precursor, a purging gas, a first nitrogen-containing gas and the purging gas, wherein the first nitrogen-containing gas reacts with the first barrier metal precursor to form a first sub-layer of the metallic barrier layer with a first nitrogen concentration.
15. The method of claim 14 , wherein deposition of the first sub-layer of the metallic barrier layer is followed by performing sequential pulsing of a second barrier metal precursor, a purging gas, a second nitrogen-containing reactant and the purging gas, wherein the second nitrogen-containing gas reacts with the second barrier metal precursor to form a second sub-layer of the metallic barrier layer with a second nitrogen concentration, and wherein the second nitrogen concentration is lower than the first nitrogen concentration.
16. A method of depositing a metallic barrier layer to line an etched interconnect structure in an atomic layer deposition system, comprising:
depositing the metallic barrier layer to line the etched interconnect structure using atomic layer deposition, the etched interconnect structure being etched into a dielectric layer, wherein a nitrogen concentration of the metallic barrier layer decreases step-wise with an increasing film thickness, and wherein the nitrogen concentration of the metallic barrier layer is changed by varying a chemical composition of one or more process gases in a sequential pulsing of process gases, by varying durations of sequential pulsing of process gases, or a combination of both, such that the nitrogen concentration of the metallic barrier layer is highest where the metallic barrier layer is in contact with the dielectric layer; and
forming a copper layer over the metallic barrier layer, such that the nitrogen concentration of the metallic barrier layer is lowest where the metallic barrier layer is in contact with the copper layer.
17. The method of claim 16 , wherein the metallic barrier layer is deposited by performing a plurality of cycles of sequential pulsing of a barrier metal precursor, a purging gas, a first nitrogen-containing gas with a first duration, and the purging gas, wherein the first nitrogen-containing gas with the first duration reacts with the barrier metal precursor to form a first sub-layer of the metallic barrier layer with a first nitrogen concentration.
18. The method of claim 17 , wherein deposition of the first sub-layer of the metallic barrier layer is followed by performing another plurality of cycles of sequential pulsing of the barrier metal precursor, the purging gas, a second nitrogen-containing gas with a second duration, and the purging gas, wherein the second nitrogen-containing gas with the second duration reacts with the barrier metal precursor to form a second sub-layer of the metallic barrier layer with a second nitrogen concentration.
19. The method of 18 , wherein the second duration is shorter than the first duration.
20. The method of claim 17 , wherein the metallic barrier layer is deposited by performing a plurality of cycles of sequential pulsing of a barrier metal precursor, a purging gas, a first nitrogen-containing gas and the purging gas, wherein the first nitrogen-containing gas reacts with the barrier metal precursor to form a first sub-layer of the metallic barrier layer with a first nitrogen concentration.
21. The method of claim 20 , wherein deposition of the first sub-layer of the metallic barrier layer is followed by performing a plurality of cycles of sequential pulsing of the barrier metal precursor, the purging gas, a second nitrogen-containing gas and the purging gas, wherein the second nitrogen-containing gas reacts with the barrier metal precursor to form a second sub-layer of the metallic barrier layer with a second nitrogen concentration and the second nitrogen concentration is lower than the first nitrogen concentration.
22. The method of claim 16 , wherein the metallic barrier layer is deposited by performing a plurality of cycles of sequential pulsing of a first barrier metal precursor, a purging gas, a nitrogen-containing gas and the purging gas, wherein the nitrogen-containing gas reacts with the first barrier metal precursor to form a first sub-layer of the metallic barrier layer with a first nitrogen concentration.
23. The method of claim 22 , wherein deposition of the first sub-layer of the metallic barrier layer is followed by performing a plurality of cycles of sequential pulsing of a second barrier metal precursor, a purging gas, a nitrogen-containing reactant and the purging gas, wherein the nitrogen-containing gas reacts with the second barrier metal precursor to form a second sub-layer of the metallic barrier layer with a second nitrogen concentration, and wherein the second nitrogen concentration is lower than the first nitrogen concentration.
24. A method of depositing a metallic barrier layer to line an etched interconnect structure in an atomic layer deposition system, comprising:
depositing the metallic barrier layer to line the etched interconnect structure using atomic layer deposition, the etched interconnect structure being etched into a dielectric layer, wherein a nitrogen concentration of the metallic barrier layer decreases with an increasing film thickness, wherein the metallic barrier layer is deposited by performing sequential pulsing of a barrier metal precursor, a purging gas, a nitrogen-containing gas and the purging gas, wherein the nitrogen-containing gas reacts with the barrier metal precursor to form the metallic barrier layer, and wherein the nitrogen concentration of the metallic barrier layer is changed by varying the amount of barrier metal precursor during the sequential pulsing, such that the nitrogen concentration of the metallic barrier layer is highest where the metallic barrier layer is in contact with the dielectric layer; and
forming a copper layer over the metallic barrier layer, such that the nitrogen concentration of the metallic barrier layer is lowest where the metallic barrier layer is in contact with the copper layer.
25. The method of claim 24 , wherein the barrier metal in the barrier layer is selected from the group consisting of tantalum (Ta), titanium (Ti), tungsten (W), zirconium (Zr), hafnium (Hf), molybdenum (Mo), niobium (Nb), vanadium (V), ruthenium (Ru) and chromium (Cr).
26. The method of claim 24 , wherein the barrier metal precursor is selected from the list containing pentaethylmethylamino-tantalum (PEMAT), pentadiethylamino-tantalum (PDEAT), pentadimethylamino-tantalum (PDMAT), tertbutylimido-tris(diethylamido)-tantalum (TBTDET), tertbutylimido-tris(dimethylamido)-tantalum (TBTDMT), tertbutylimido-tris(ethylmethylamido)-tantalum (TBTEMT), and tantalum halides TaX 5 , wherein X is fluorine (F), bromine (Br) or chlorine (Cl), and any and all derivatives thereof.