IP Library Patent Application 11595426
Patent Application
App. No. 11/595,426

Storage devices based on resonant tunneling

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Quick Facts
Patent No.
US None
App. No.
11/595,426
Abstract

The present invention discloses a resonant tunneling device. Further, the present invention discloses a memory storage device utilizing a resonant tunneling barrier. Moreover, the present invention teaches an SRAM circuit utilizing a resonant tunneling device. Additionally, the present invention teaches an NROM and NAND device utilizing a resonant tunneling barrier.

Claims (20)

1 . A storage device comprising:

a source,

a resonant tunneling barrier coupled to said source,

a drain coupled to said resonant tunneling barrier,

a floating gate,

a blocking layer, and

a gate electrode,

wherein said floating gate is sandwiched between said blocking layer and said resonant tunneling barrier, and said blocking layer is sandwiched between said floating gate and said gate electrode.

2 . The storage device as claimed in claim 1 wherein said resonant tunneling barrier comprises:

a first bandgap,

a second bandgap, and

a third bandgap sandwiched between said first bandgap and said second bandgap;

wherein said first bandgap and said second bandgap are larger than said third bandgap.

3 . The device as claimed in claim 2 wherein said first bandgap consists essentially of one of SiO 2 and Al 3 O 4 .

4 . The device as claimed in claim 2 wherein said second bandgap consists essentially of one of SiO 2 and Al 3 O 4 .

5 . The device as claimed in claim 2 wherein said third bandgap consists essentially of one of poly-crystalline silicon, crystalline silicon, Pt, Ir, Ni, Ge, Be, Re, TaO, TaN, BaTiO, BaZrO, ZrO, HfO, TiN, Ti, ZrN, WN, Mo, MoN, and MoSi.

6 . The device as claimed in claim 3 wherein said second bandgap consists essentially of one of SiO 2 and Al 3 O 4 .

7 . The device as claimed in claim 6 wherein said third bandgap consists essentially of one of poly-crystalline silicon, crystalline silicon, Pt, Ir, Ni, Ge, Be, Re, TaO, TaN, BaTiO, BaZrO, ZrO, HfO, TiN, Ti, ZrN, WN, Mo, MoN, and MoSi.

8 . The storage device as claimed in claim 1 wherein said blocking layer is a thin oxide film.

9 . The storage device as claimed in claim 1 wherein said device consists essentially of one of a flash memory cell, NAND, NOR, NROM, and MirrorBit.

Assignments (3)
RELEASE OF SECURITY INTEREST Recorded Dec 22, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: CYPRESS SEMICONDUCTOR CORPORATION; SPANSION LLC
Reel/Frame 041175/0939 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 14, 2016
From: CYPRESS SEMICONDUCTOR CORPORATION
To: MONTEREY RESEARCH, LLC
Reel/Frame 040908/0960 →
PATENT PURCHASE AGREEMENT Recorded Mar 28, 2012
From: NANTRONICS SEMICONDUCTOR, INC.
To: SPANSION LLC
Reel/Frame 027946/0448 →