Apparatus and Method for Carrying Substrates
The present invention provides a method and an apparatus for carrying at least one substrate for plasma processing. The method and apparatus comprising a carrier for transporting the substrate, that is located unbonded on the carrier, onto a substrate support within a plasma system for plasma processing. An electrostatic clamp, that is coupled to the substrate support, electrostatically secures the substrate to the substrate support through the carrier during plasma processing.
1 . An apparatus for carrying at least one substrate for plasma processing, comprising:
a substrate support;
a carrier for transporting the substrate onto said substrate support, wherein the substrate is located unbonded on said carrier; and
a clamping mechanism coupled to said substrate support, wherein said clamping mechanism is configured to move between an inactive position and an active position, whereby the substrate is clamped to said substrate support through said carrier when said clamping mechanism is in said active position.
2 . The apparatus according to claim 1 wherein said carrier further comprising a cover plate.
3 . The apparatus according to claim 1 wherein said carrier further comprising at least one recess, the substrate being position within said recess.
4 . The apparatus according to claim 1 wherein said carrier further comprising a plurality of retaining pins, the substrate being position on said carrier by said plurality of retaining pins.
5 . The apparatus according to claim 1 wherein said carrier further comprising a plurality of holes, said plurality of holes conducting a gas to the backside of the substrate.
6 . An apparatus for carrying at least one substrate for plasma processing, comprising:
a substrate support;
a carrier for transporting the substrate onto said substrate support, wherein the substrate is located unbonded on said carrier; and
an electrostatic clamp coupled to said substrate support, wherein the substrate is electrostatically secured to said substrate support through said carrier by said electrostatic clamp.
7 . The apparatus according to claim 6 wherein said carrier further comprises a dielectric material.
8 . The apparatus according to claim 7 wherein said dielectric material is selected from the group consisting of alumina, aluminum oxide ceramic, sapphire and quartz.
9 . The apparatus according to claim 6 wherein said carrier further comprising a cover plate.
10 . The apparatus according to claim 6 wherein said carrier further comprising at least one recess, the substrate being position within said recess.
11 . The apparatus according to claim 6 wherein said carrier is a membrane.
12 . The apparatus according to claim 6 wherein said carrier further comprising a plurality of retaining pins, the substrate being position on said carrier by said plurality of retaining pins.
13 . The apparatus according to claim 6 wherein said carrier further comprising a plurality of holes, said plurality of holes conducting a gas to the backside of the substrate.
14 . The apparatus according to claim 6 wherein said carrier further comprising a conductive layer on at least part of the bottom of said carrier.
15 . A method for carrying at least one substrate for plasma processing, comprising:
providing a substrate support;
providing an electrostatic clamp coupled to said substrate support;
providing a carrier;
placing the substrate onto said carrier, the substrate is located unbonded on said carrier;
transporting said carrier with the unbonded substrate onto said substrate support; and
electrostatically clamping the substrate to said substrate support through said carrier by said electrostatic clamp.
16 . The method according to claim 15 wherein said carrier further comprises a dielectric material.
17 . The method according to claim 16 wherein said dielectric material is selected from the group consisting of alumina, aluminum oxide ceramic, sapphire and quartz.
18 . The method according to claim 15 wherein the substrate is a MEMS substrate.
19 . The method according to claim 15 wherein the substrate is a fragile substrate.
20 . The method according to claim 15 wherein the substrate further comprising a dielectric film.
21 . The method according to claim 20 wherein said dielectric film is silicon dioxide.
22 . The method according to claim 15 wherein the substrate is electrically conducting.
23 . The method according to claim 15 wherein the substrate is partially conducting.
24 . The method according to claim 23 wherein the substrate is selected from the group consisting of silicon and silicon carbide.
25 . The method according to claim 15 wherein said carrier further comprising at least one recess for holding the substrate unbonded in a fixed position on said carrier.
26 . The apparatus according to claim 15 wherein said carrier is a membrane.
27 . The method according to claim 15 wherein said carrier further comprising a plurality of retaining pins for holding the substrate unbonded in a fixed position on said carrier.
28 . The method according to claim 15 wherein said carrier further comprising a conductive layer on at least part of the bottom of said carrier.
29 . The method according to claim 15 wherein said carrier further comprising a plurality of holes.
30 . The method according to claim 29 further comprising providing a gas to the backside of the substrate through said plurality of holes in said carrier
31 . The method according to claim 30 wherein said gas is helium.