Semiconductor memory device and defect remedying method thereof
View Patent ↗A semiconductor memory device formed on a semiconductor chip includes first memory arrays, a plurality of second memory arrays, a first voltage generator, and first bonding pads. The semiconductor chip is divided into first, second and third rectangle regions and the third rectangle region is arranged between the first rectangle region and the second rectangle region. The first memory arrays are formed in the first rectangle region. The second memory arrays are formed in the second rectangle region. The voltage generator and first bonding pads are arranged in the third rectangle region. The first bonding pads are arranged between the first rectangle region and the voltage generator and no bonding pads are arranged between the voltage generator and the second memory arrays.
1. A semiconductor memory device formed on a semiconductor chip comprising:
a plurality of first memory arrays;
a plurality of second memory arrays;
a first voltage generator; and
a plurality of first bonding pads;
wherein the semiconductor chip is divided into a first rectangle region, a second rectangle region, and a third rectangle region,
wherein the third rectangle region is arranged between the first rectangle region and the second rectangle region,
wherein the plurality of first memory arrays are formed in the first rectangle region,
wherein the plurality of second memory arrays are formed in the second rectangle region,
wherein the voltage generator and the plurality of first bonding pads are arranged in the third rectangle region,
wherein the plurality of first bonding pads are arranged between the first rectangle region and the voltage generator;
wherein no bonding pads are arranged between the first voltage generator and the plurality of second memory arrays, and
wherein the first voltage generator is provided at a center portion between the plurality of first memory arrays and the plurality of second memory arrays.
2. A semiconductor memory device according to claim 1 ,
wherein the first voltage generator is a substrate voltage generator.
3. A semiconductor memory device according to claim 2 , further comprising:
a second voltage generator adapted to generate an internal voltage which is supplied to the first and second memory array; and
a plurality of second bonding pads,
wherein the plurality of second bonding pads are arranged between the second voltage generator and the first rectangle region, and
wherein no bonding pads are arranged between the second voltage generator and the second rectangle region.
4. A semiconductor memory device according to claim 3 , wherein the semiconductor device is DRAM.
5. A semiconductor memory device according to claim 2 , wherein the semiconductor device is DRAM.
6. A semiconductor memory device according to claim 1 , further comprising:
a second voltage generator adapted to generate an internal voltage which is supplied to the first and second memory array; and
a plurality of second bonding pads,
wherein the plurality of second bonding pads are arranged between the second voltage generator and the first rectangle region, and
wherein no bonding pads are arranged between the second voltage generator and the second rectangle region.
7. A semiconductor memory device according to claim 6 , wherein the semiconductor device is DRAM.
8. A semiconductor memory device according to claim 1 , wherein the semiconductor device is DRAM.
9. A semiconductor memory device according to claim 1 ,
wherein the first rectangle region, the third rectangle region, and the second rectangle region are sequentially arranged in a first direction, and
wherein the plurality of first bonding pads are arranged in a second direction which is across the first direction.
10. A semiconductor memory device according to claim 9 ,
wherein the plurality of first bonding pads are arranged in two rows in the second direction.