Integrated circuit having multilayer electrode
View Patent ↗An integrated circuit includes a contact and a first electrode coupled to the contact. The first electrode includes at least two electrode material layers. The at least two electrode material layers include different materials. The integrated circuit includes a second electrode and a resistivity changing material between the first electrode and the second electrode.
1. An integrated circuit comprising:
a contact;
a first electrode coupled to the contact, the first electrode including at least two electrode material layers, the at least two electrode material layers comprising different materials:
a second electrode; and
a resistivity changing material between the first electrode and the second electrode,
wherein the first electrode comprises a first electrode material layer contacting a second electrode material layer, and a third electrode material layer contacting the second electrode material layer, the first electrode material layer comprising a same material as the third electrode material layer, and the first electrode material layer comprising a different material from the second electrode material layer.
2. The integrated circuit of claim 1 , wherein the second electrode material layer comprises one of TiN, TaN, W, WN, TiSiN, TiAlN, TaSiN, TaCN, TaAlN, C, Si, Ge, and a phase change material.
3. The integrated circuit of claim 1 , wherein the first electrode material layer comprises one of TiN, TaN, W, WN, TiSiN, TiAlN, TaSiN, TaCN, TaAlN, and C.
4. The integrated circuit of claim 1 , wherein the resistivity changing material comprises phase change material.
5. The integrated circuit of claim 1 , wherein the first electrode thermally insulates the contact from the resistivity changing material.
6. The integrated circuit of claim 1 , wherein the resistivity changing material comprises a first portion having a first cross-sectional width and a second portion having a second cross-sectional width different from the first cross-sectional width.
7. The integrated circuit of claim 6 , wherein the first portion is tapered and contacts the first electrode.
8. The integrated circuit of claim 6 , wherein the second portion contacts the second electrode, and
wherein the second cross-sectional width is equal to a cross-sectional width of the second electrode.
9. The integrated circuit of claim 1 , wherein the contact comprises one of TiN, TaN, W, Al, Ti, Ta, TiSiN, TaSiN, TaCN, TiAlN, TaAlN, Cu, WN, and C.
10. The integrated circuit of claim 1 , wherein the resistivity changing material provides a storage location for storing one or more bits of data.
11. The integrated circuit of claim 1 , further comprising:
dielectric material laterally surrounding the contact, the first electrode, the second electrode, and the resistivity changing material.
12. The integrated circuit of claim 11 , wherein the dielectric material comprises one of SiO 2 , SiO x , SiN, fluorinated silica glass (FSG), boro-phosphorous silicate glass (BPSG), and boro-silicate glass (BSG).
13. An integrated circuit comprising:
a contact;
a first electrode coupled to the contact, the first electrode including at least three electrode material layers, at least two of the at least three electrode material layers comprising different materials;
a second electrode; and
a resistivity changing material between the first electrode and the second electrode.
14. An integrated circuit of claim 13 , wherein the first electrode comprises at least four electrode material layers.
15. An integrated circuit of claim 13 , wherein the first electrode comprises at least five electrode material layers.
16. The integrated circuit of claim 13 , wherein at least one of the electrode material layers comprises one of TiN, TaN, W, WN, TiSiN, TiAlN, TaSiN, TaCN, TaAlN, C, Si, Ge, and a phase change material.
17. The integrated circuit of claim 13 , wherein the resistivity changing material comprises phase change material.
18. The integrated circuit of claim 13 , wherein the first electrode thermally insulates the contact from the resistivity changing material.
19. The integrated circuit of claim 13 , wherein the resistivity changing material comprises a first portion having a first cross-sectional width and a second portion having a second cross-sectional width different from the first cross-sectional width.
20. The integrated circuit of claim 19 , wherein the first portion is tapered and contacts the first electrode.
21. The integrated circuit of claim 19 , wherein the second portion contacts the second electrode, and
wherein the second cross-sectional width is equal to a cross-sectional width of the second electrode.
22. The integrated circuit of claim 13 , wherein the contact comprises one of TiN, TaN, W, Al, Ti, Ta, TiSiN, TaSiN, TaCN, TiAlN, TaAlN, Cu, WN, and C.
23. The integrated circuit of claim 13 , wherein the resistivity changing material provides a storage location for storing one or more bits of data.
24. The integrated circuit of claim 13 , further comprising:
dielectric material laterally surrounding the contact, the first electrode, the second electrode, and the resistivity changing material.
25. The integrated circuit of claim 24 , wherein the dielectric material comprises one of SiO 2 , SiO x , SiN, fluorinated silica glass (FSG), boro-phosphorous silicate glass (BPSG), and boro-silicate glass (BSG).