Manufacturing method of semiconductor device
View Patent ↗This invention is directed to form a homogeneous film in a via hole formed in a semiconductor device using Bosch process. The via hole that penetrates through a predetermined region in a semiconductor substrate is formed by etching the semiconductor substrate from one of its surface to the other by the Bosch process using a mask layer as a mask. Next, the mask layer is removed. Then, scallops are removed by dry etching to flatten a sidewall of the via hole. Following the above, an insulation film, a barrier layer and the like are formed homogeneously in the via hole.
1. A method of manufacturing a semiconductor device, comprising:
providing a semiconductor substrate comprising a first surface, a second surface opposite from the first surface, an insulation film formed on the first surface and a pad electrode disposed on the insulation film;
forming a mask layer on the second surface so that an opening is formed in the mask layer at a location corresponding to the pad electrode;
providing an apparatus configured to perform a Bosch process, which comprises a plasma etching to etch the substrate and a plasma deposition to deposit a protection film that are alternated;
forming a via hole in the substrate using the mask layer so as to expose the insulation film by performing the Bosch process using the apparatus, a sidewall of the formed via hole having scallops formed by the Bosch process; and
reducing the scallops formed by the Bosch process on the sidewall of the via hole after the formation of the via hole.
2. The method of claim 1 , further comprising removing the mask layer, removing the insulation film to expose the pad electrode at a bottom of the hole, wherein the removing of the mask layer, the removing of the insulation film and the reducing of the scallops are performed simultaneously.
3. The method of claim 1 , further comprising forming a conductive layer in the via hole so as to be electrically connected with the pad electrode.
4. The method of claim 1 , wherein the reducing of the scallops comprises a dry etching.
5. The method of claim 1 , wherein the reducing of the scallops comprises an etching using an etching gas comprising a CF 4 gas.
6. The method of claim 1 , further comprising removing the insulation film to expose the pad electrode at a bottom of the hole, wherein the removing of the insulation film and the reducing of the scallops are performed simultaneously.