IP Library Granted Patent US 7,791,022
Granted Patent B2
US 7,791,022 · App. 11/821,028 · Granted Sep 7, 2010

Scanning electron microscope with length measurement function and dimension length measurement method

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Quick Facts
Patent No.
US 7,791,022
App. No.
11/821,028
Granted
Sep 7, 2010
Kind
B2
Abstract

A scanning electron microscope with a length measurement function includes an electron gun for emitting an electron beam, a measurement target region setting unit for setting a measurement region for a pattern formed on a sample, a storing unit for storing the designated measurement region, a beam blanker unit for controlling an irradiation of the electron beam depending on the measurement region, and a control unit for extracting the designated measurement region from the storing unit, interrupting the electron beam with the beam blanker unit in a region other than the measurement region, irradiating the electron beam onto the sample in the measurement region, capturing an image of the measurement region, and measuring the pattern. The measurement region may be a pair of regions having the same areas as each other.

Claims (29)

1. A scanning electron microscope with a length measurement function, comprising:

an electron gun emitting an electron beam;

a measurement target region setting unit for setting a measurement region where the measurement region is a pair of regions having the same areas each surrounding a corresponding edge of a pattern formed on a sample to measure a length of a pattern or one or more pairs of regions each of pair having the same areas each surrounding a corresponding edge of a plurality of patterns formed on the sample to measure a length between different patterns;

a storing unit for storing position information on the designated measurement region;

a beam blanker unit for controlling an irradiation of the electron beam depending on the measurement region; and

a control unit,

wherein the control unit extracts the position information of the designated measurement region from the storing unit,

in a region other than the measurement region, the control unit interrupts the electron beam with the beam blanker unit, and

in the measurement region, the control unit irradiates the electron beam passed through the beam blanker unit only onto the pair of regions with the same areas, captures an image of the measurement region, and thereby measures the length of the pattern.

2. The scanning electron microscope with the length measurement function according to claim 1 ,

wherein the beam blanker unit includes an electrostatic electrode and a beam control plate having an aperture, and wherein the control unit scans the electron beam, and the control unit does not apply a voltage to the electrostatic electrode with respect to the measurement region so that the electron beam is passed through the aperture and irradiated onto the sample,

in a region other than the measurement region, the control unit causes the electron beam to be irradiated onto the beam control plate by applying a voltage to the electrostatic electrode, so that irradiation of the electron beam to the region other than the measurement region is interrupted.

3. The scanning electron microscope with the length measurement function according to claim 1 ,

wherein the beam blanker unit includes an electrostatic electrode and a beam control plate having an aperture,

the control unit refers to coordinate data indicative of the measurement region stored in the storing unit, applies a voltage to the electrostatic electrode, deflects an irradiation position to the measurement region with the electron beam interrupted, sets the voltage applied to the electrostatic electrode to OFF, and

the electron beam is thus irradiated only in the measurement region.

4. A method of measuring the dimension of a sample using a scanning electron microscope, which includes an electron gun emitting an electron beam, a measurement target region setting unit for setting a measurement region for a pattern formed on a sample, a storing unit for storing the designated measurement region, and a beam blanker unit for controlling an irradiation of the electron beam depending on the measurement region, comprising the steps of:

designating the measurement region which is a pair of regions having the same area each surrounding a corresponding edge of a pattern formed on a sample to measure a length of a pattern or one or more pairs of regions each of pair having the same areas each surrounding a corresponding edge of a plurality of patterns formed on the sample to measure a length between different patterns;

extracting position information on the measurement region from the storing unit;

irradiating the electron beam only in the measurement region;

capturing an image of the measurement region; and

measuring the dimension of the pattern by extracting an edge of the pattern on the basis of the image.

5. The method of measuring the dimension of a sample using the scanning electron microscope according to claim 4 , wherein the step of irradiating the electron beam only in the measurement region includes the following steps of:

setting a minimum region containing the measurement region;

in the case of the measurement region, setting a voltage applied to an electrostatic electrode of the beam blanker to OFF, so that the electron beam is irradiated onto the sample, and

in the case of a region other than the measurement region, setting a voltage applied to the electrostatic electrode of the beam blanker to ON, so that the electron beam is interrupted.

6. The method of measuring the dimension of a sample using the scanning electron microscope according to claim 5 , wherein the step of irradiating the electron beam only in the measurement region includes the steps of:

interrupting the electron beam by applying a voltage to the electrostatic electrode, and then deflecting an irradiation position to the measurement region, with reference to coordinate data indicative of the measurement region stored in the storing unit; and

setting the voltage applied to the electrostatic electrode to OFF, so that the electron beam is irradiated only in the measurement region.

Assignments (2)
CHANGE OF ADDRESS Recorded Dec 18, 2018
From: ADVANTEST CORPORATION
To: ADVANTEST CORPORATION
Reel/Frame 047987/0626 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 4, 2007
From: NAKAMURA, TAKAYUKI; IWAI, TOSHIMICHI; SHIDA, SOICHI; HIROYAMA, MITSUO
To: ADVANTEST CORPORATION
Reel/Frame 019811/0755 →