Semiconductor device and method of manufacturing the same
View Patent ↗A conventional semiconductor device, for example, a lateral PNP transistor has a problem that it is difficult to obtain a desired current-amplification factor while maintaining a breakdown voltage characteristic without increasing the device size. In a semiconductor device, that is a lateral PNP transistor, according to the present invention, an N type epitaxial layer is formed on a P type single crystal silicon substrate. The epitaxial layer is used as a base region. Moreover, molybdenum (Mo) is diffused in the substrate and the epitaxial layer. With this structure, the base current is adjusted, and thereby a desired current-amplification factor (hFE) of the lateral PNP transistor is achieved.
1. A semiconductor device comprising:
a silicon substrate of one conductivity type; and
an epitaxial layer of an opposite conductivity type on the substrate, wherein an emitter region, a base region and a collector region are in the epitaxial layer and
molybdenum (Mo) is diffused through the entire thickness of the epitaxial layer and the substrate.
2. The semiconductor device according to claim 1 ,
wherein the collector region, the base region, and the emitter region are arranged as a lateral PNP transistor,
the collector region surrounds the emitter region, and
a distance separating the emitter region from the collector region corresponds to a width of the base region.
3. The semiconductor device according to claim 1 , wherein an opposite conductivity type impurity in the epitaxial layer comprises antimony (Sb).
4. The semiconductor device according to claim 1 , wherein the epitaxial layer is silicon.