Granted Patent B2

US 7,527,442 · App. 11/872,055 · Granted May 5, 2009

Abstract

Claims (19)

1. A process for forming a resist pattern in which a photoresist is coated on a substrate, the coated photoresist is exposed to light of a predetermined pattern, and afterwards developing is performed on the exposed pattern, wherein

after at least one of said processes of coating, exposing, and developing, whenever lots to which said substrate belongs change, the atmosphere surrounding said substrate is changed at a desired exhaust flow rate, which is controlled by changing a number of bypass lines for exhaust flow, and heat treatment is performed on said substrate.

2. A process for forming a resist pattern in which a photoresist is coated on a first substrate, the coated photoresist is exposed to light of a predetermined pattern, and afterwards developing is performed on the exposed pattern, comprising the steps of:

placing a plate in a chamber for heat treatment, said plate having a plurality of apertures;

placing said first substrate on which photoresist is coated in said chamber;

comparing the type of photoresist coated on said first substrate and the type of photoresist coated on a second substrate that was heat treated immediately prior to said first substrate in said chamber, and determining whether they are the same or not;

changing the atmosphere in said chamber by controlling internal diameters of the apertures in the case where it is determined in said determining step that the type of photoresist on said first substrate and the type of the photoresist on said second substrate are not the same; and

applying heat treatment to said first substrate in said chamber after said changing step.

3. A resist coating and developing apparatus for coating a photoresist on a first substrate, exposing the coated photoresist to light of a predetermined pattern, and afterwards developing said pattern to form a resist pattern, wherein there are provided:

a chamber for heat treatment, which accommodates the first substrate on which said photoresist is coated;

a discharge section which discharges gas in said chamber to the outside of said chamber;

a plurality of bypass lines provided with valves which adjust the flow rate, and which interconnect with said chamber; and

a first exhaust adjustment section, which uses said bypass lines by opening and closing the valves, in response to the results of a comparison of the characteristics of a second substrate that was heat treated in said chamber immediately prior to said first substrate and the characteristics of said first substrate, to increase the exhaust flow rate, and change the atmosphere in said chamber,

wherein control of the exhaust flow rate is performed by changing the number of said bypass lines used by said a first exhaust adjustment section.

4. A resist coating and developing apparatus for coating a photoresist on a first substrate, exposing the coated photoresist to light of a predetermined pattern, and afterwards developing said pattern to form a resist pattern, wherein there are provided:

a chamber for heat treatment, which accommodates a first substrate on which said photoresist is coated;

a discharge section which discharges gas in said chamber to the outside of said chamber;

a top plate which is placed inside said chamber and which has apertures for regulating the air stream flowing into said chamber; and

a second exhaust adjustment section which changes the atmosphere in said chamber by controlling the internal diameters of said apertures in response to the results of a comparison of the characteristics of a second substrate that was heat treated in said chamber immediately prior to said first substrate and the characteristics of said first substrate.

Assignments (9)