IP Library Granted Patent US 8,198,738
Granted Patent B1
US 8,198,738 · App. 11/873,229 · Granted Jun 12, 2012

Structure of bond pad for semiconductor die and method therefor

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Quick Facts
Patent No.
US 8,198,738
App. No.
11/873,229
Granted
Jun 12, 2012
Kind
B1
Abstract

A bond pad and a method of making the same for a semiconductor die has a bonding region formed on the bond pad. A test region is formed on the bond pad and is adjacent to the bonding region.

Claims (37)

1. A bond pad area for a semiconductor die comprising:

a plurality of bonding pads, wherein each bonding pad comprises:

a bonding region formed on the bond pad;

a test region formed on the bond pad, the test region formed adjacent to the bonding region, the test region allowing for a probe mark to be formed thereon; and

an indented region formed on a side of the bond pad opposite of the test region to prevent the test region of the bond pad from interfering with a test region from a neighboring bond pad;

wherein each test region of each bond pad on a first side of the semiconductor die are aligned in a first row and wherein each bonding region of each bond pad on the first side of the semiconductor die are aligned in a second row, wherein the first row and the second row are approximately parallel.

2. A bond pad for a semiconductor die in accordance with claim 1 , wherein the bonding region and the test region are formed of a similar conductive material.

3. A bond pad for a semiconductor die in accordance with claim 1 , wherein the bonding region has an area larger than an area of the test region.

4. A bond pad for a semiconductor die in accordance with claim 1 , wherein both the bonding region and test region have a generally rectangular shape.

5. A bond pad for a semiconductor die in accordance with claim 4 , wherein a corner area of the test region is connected to a corner area of the bonding region.

6. A bond pad for a semiconductor die in accordance with claim 5 further comprising an insulative protection layer formed around a perimeter of the bond pad for enclosing the bond pad.

7. A bond pad for a semiconductor die in accordance with claim 1 , wherein the bonding region has a generally rectangular shape and the test region has a generally circular shape.

8. A bond pad for a semiconductor die in accordance with claim 7 , wherein the test region is connected to a corner of the bonding region.

9. A bond pad for a semiconductor die in accordance with claim 8 further comprising means for preventing interfering with the bond pad from a neighboring bond pad.

10. A bond pad for a semiconductor die in accordance claim 1 , wherein the bonding region and the test region have a generally circular shape.

11. A bond pad for a semiconductor die in accordance with claim 1 , wherein the bonding region has a generally circular shape and the test region has a generally rectangular shape.

12. A bond pad for a semiconductor die in accordance with claim 1 , wherein the bonding region has a generally hexagonal shape and the test region has a generally square shape.

13. A bond pad for a semiconductor die in accordance wherein the bonding region has a generally hexagonal shape and the test region has a generally circular shape.

14. A bond pad area for a semiconductor die comprising:

a plurality of bond pads, wherein each bond pad comprises:

a bonding region formed on the bond pad;

means for testing the semiconductor die formed adjacent to the bonding region and for allowing a probe mark to be formed thereon; and

an indented region formed on a side of the bond pad opposite of the test region to prevent the test region of the bond pad from interfering with a test region from a neighboring bond pad;

wherein the means for testing of each bond pad on a first side of the semiconductor die are aligned in a first row and wherein the bonding region of each bond pad on the first side of the semiconductor die are aligned in a second row.

15. A bond pad for a semiconductor die in accordance with claim 14 , wherein the bonding region and the means for testing are formed of a similar conductive material.

16. A bond pad for a semiconductor die in accordance with claim 14 , wherein the bonding region has an area larger than an area of the means for testing.

17. A semiconductor die comprising a plurality of bond pads, each bond pad comprising:

a bonding region for receiving a conductive interconnect;

a test region, adjacent to the bonding region, for receiving a test probe, the test region allowing for a probe mark to be formed thereon by the test probe; and

an indented region formed on a side of the bond pad opposite of the test region to prevent the test region of the bond pad from interfering with a test region from a neighboring bond pad;

wherein the test region of each bond pad on a first side of the semiconductor die are aligned in a row.

18. A semiconductor die in accordance with claim 17 , wherein the conductive interconnect is a wirebond.

19. A semiconductor die in accordance with claim 17 , wherein the conductive interconnect is a bump.

20. A semiconductor die in accordance with claim 17 , wherein the bonding region and the test region are formed of a similar conductive material.

21. A bond pad for a semiconductor die in accordance with claim 1 , wherein the bonding region, the test region and the indent region are formed on a first surface of a substrate.

22. A bond pad for a semiconductor die in accordance with claim 14 wherein the bonding region, means for testing, and the indented region are formed on a first surface of the substrate.

23. A semiconductor die in accordance with claim 17 wherein the semiconductor die further comprising a substrate, the bonding region, the test region, and the indented region formed on a first surface of the substrate.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 9, 2020
From: AMKOR TECHNOLOGY, INC.
To: AMKOR TECHNOLOGY SINGAPORE HOLDING PTE.LTD.
Reel/Frame 054067/0135 →
SECURITY INTEREST Recorded Aug 1, 2018
From: AMKOR TECHNOLOGY, INC.
To: BANK OF AMERICA, N.A., AS AGENT
Reel/Frame 046683/0139 →