Nitride-based light-emitting device and method of manufacturing the same
A nitride-based light-emitting device capable of suppressing reduction of the light output characteristic as well as reduction of the manufacturing yield is provided. This nitride-based light-emitting device comprises a conductive substrate at least containing a single type of metal and a single type of inorganic material having a lower linear expansion coefficient than the metal and a nitride-based semiconductor element layer bonded to the conductive substrate.
1. A method of manufacturing a nitride-based light-emitting device, comprising steps of:
growing a nitride-based semiconductor element layer on a growth substrate;
forming an electrode on a surface of said nitride-based semiconductor element layer;
bonding a conductive substrate at least containing a single type of metal and a single type of inorganic material having a lower linear expansion coefficient than said metal on a surface of said electrode; and
removing said growth substrate from said nitride-based semiconductor element layer to which said conductive substrate is bonded through said electrode, wherein
said step of forming said electrode on said surface of said nitride-based semiconductor element layer includes steps of:
forming a protective film on a side surface of said nitride-based semiconductor element layer,
texturing said surface of said nitride-based semiconductor element layer after forming said protective film, and
forming said electrode on said textured surface of said nitride-based semiconductor element layer.
2. The method of manufacturing a nitride-based light-emitting device according to claim 1 , wherein
said inorganic material includes a metal oxide.
3. The method of manufacturing a nitride-based light-emitting device according to claim 1 , wherein
said step of forming said electrode on said textured surface of said nitride-based semiconductor element layer includes a step of forming said electrode on said textured surface of said nitride-based semiconductor element layer to have a textured surface reflecting said texture on said surface of said nitride-based semiconductor element, and
said step of bonding said conductive substrate to said surface of said electrode opposite to said nitride-based semiconductor element layer includes steps of:
texturing a surface of said conductive substrate, and
bonding said conductive substrate to said surface of said electrode opposite to said nitride-based semiconductor element layer so that the positions of projecting and recess portions of said electrode and the positions of recess and projecting portions of said conductive substrate coincide with each other.
4. The method of manufacturing a nitride-based light-emitting device according to claim 1 , wherein
said step of forming said electrode on said surface of said nitride-based semiconductor element layer includes steps of:
forming said protective film on said surface and said side surface of said nitride-based semiconductor element layer,
removing said protective film on said surface of said nitride-based semiconductor element layer after forming said protective film, and
texturing a region of said surface of said nitride-based semiconductor element layer where said protective film is removed.