Substrate with marker, manufacturing method thereof, laser irradiation apparatus, laser irradiation method, light exposure apparatus, and manufacturing method of semiconductor device
View Patent ↗To provide a laser irradiation apparatus which performs alignment of an irradiated object and emits a laser beam precisely, a laser irradiation method, and a manufacturing method of a TFT with high reliability with the use of a method for precisely targeting a desired irradiation position of the laser beam. A substrate with marker is mounted on a stage formed using a material which transmits infrared light; a marker, which is provided in the substrate with marker mounted on the stage, is detected using a camera capable of sensing infrared light, and a position of the stage is controlled; a laser beam is emitted from a laser oscillator; the laser beam emitted from the laser oscillator is processed into a linear shape by an optical system, and the substrate with marker mounted on the stage is irradiated with the laser beam.
1. A manufacturing method of a semiconductor device comprising the steps of:
forming a film having a marker over one surface of a substrate;
mounting the substrate on a stage including an opening so that a surface of the film contacts with the stage, and the marker overlaps with the opening;
detecting the marker using a camera which senses infrared light;
controlling a position of the stage;
emitting a laser beam from a laser oscillator;
processing the laser beam emitted from the laser oscillator into a linear shape by an optical system; and
crystallizing a semiconductor film formed over the other surface of the substrate by irradiating with the laser beam processed into the linear shape,
wherein the substrate transmits infrared light, and
wherein the film does not transmit infrared light.
2. The manufacturing method of a semiconductor device according to claim 1 , wherein the substrate is fixed by a suction hole of the stage.
3. The manufacturing method of a semiconductor device according to claim 1 , wherein the substrate includes at least two markers, and wherein a position of the stage is controlled so that a line segment connecting the two markers and a scanning direction of the laser beam are parallel to each other.
4. The manufacturing method of a semiconductor device according to claim 1 , wherein a scanning direction of the laser beam is parallel to a direction of carrier transfer in a channel region of a transistor in which the semiconductor film is used as a channel region.
5. The manufacturing method of a semiconductor device according to claim 1 , wherein the infrared light has a wavelength between 800 nm to 1500 nm.
6. A manufacturing method of a semiconductor device comprising the steps of:
forming a film having a marker over one surface of a substrate;
mounting the substrate on a stage so that a surface of the film over which the marker is provided contacts with the stage;
detecting the marker formed over the surface of the film using a camera which senses infrared light;
controlling a position of the stage;
emitting a laser beam from a laser oscillator;
processing the laser beam emitted from the laser oscillator into a linear shape by an optical system; and
crystallizing a semiconductor film formed over the other surface of the substrate by irradiating with the laser beam processed into the linear shape,
wherein the substrate transmits infrared light, and
wherein the film does not transmit infrared light.
7. The manufacturing method of a semiconductor device according to claim 6 , wherein the substrate is fixed by a suction hole of the stage.
8. The manufacturing method of a semiconductor device according to claim 6 , wherein the substrate includes at least two markers, and wherein a position of the stage is controlled so that a line segment connecting the two markers and a scanning direction of the laser beam are parallel to each other.
9. The manufacturing method of a semiconductor device according to claim 6 , wherein a scanning direction of the laser beam is parallel to a direction of carrier transfer in a channel region of a transistor in which the semiconductor film is used as a channel region.
10. The manufacturing method of a semiconductor device according to claim 1 , wherein the infrared light has a wavelength between 800 nm to 1500 nm.