Method for producing shock and tamper resistant microelectronic devices
View Patent ↗A method of producing a microelectronic device resistant to tampering, inspection and damage from surrounding environment or operating conditions includes: (i) applying an adhesion layer on a circuit including a die fixed and electrically connected to a laminate substrate; (ii) spraying, through a flame spray process, a tamper resistant coating over the applied adhesion layer; (iii) applying a first encapsulant for filling spaces and air pockets; (iv) removing air and gases from the first encapsulant; and (v) applying a second encapsulant around the first encapsulant for providing a moisture barrier 42 and handling surfaces for the microelectronic device.
1. A method for producing a circuit comprising at least one die electrically connected to a substrate, the method comprising:
forming a tamper-resistant coating over the circuit for preventing circuit inspection and circuit tampering by spraying the circuit with a molten material;
forming a first protective barrier around the circuit by applying a first encapsulant material after the forming of the tamper-resistant coating;
removing air pockets from the first encapsulant material; and
electrically connecting the at least one die to the substrate before forming the first protective barrier.
2. The method of claim 1 wherein before forming the tamper-resistant coating, the method further comprises:
applying a primer material over the circuit, the primer material for promoting adhesion of, and protection from, the molten material of the tamper-resistant coating.
3. The method of claim 2 wherein removing air pockets from the first encapsulant material comprises at least one of (i) vacuum baking the first protective barrier formed around the circuit and (ii) applying the first encapsulant material in a vacuum.
4. The method of claim 2 wherein prior to applying the primer material to the circuit, the method further comprises masking surfaces of the circuit where primer material and tamper-resistant coating is not desired.
5. The method of claim 1 wherein after removing air pockets from the first encapsulant material, the process further comprises forming a second protective barrier around the circuit by applying a second encapsulant material.
6. The method of claim 5 wherein the second encapsulant material, when in a liquid state, has a higher viscosity than a liquid state of the first encapsulant material.
7. The method of claim 1 wherein the substrate comprises a laminate substrate.
8. The method of claim 5 wherein removing air pockets from the first encapsulant material comprises vacuum baking the first protective barrier formed around circuit.
9. The method of claim 5 wherein removing air pockets from the first encapsulant material comprises applying the first encapsulant material in an environment having a lower pressure than atmospheric pressure.
10. The method of claim 5 wherein removing air pockets from the first encapsulant material comprises applying the first encapsulant material by injecting the first encapsulant under a pressure.
11. A method for producing a shock and tamper resistant coating for a microelectronic device electrically connected to a substrate, the method comprising:
applying a thermal protection coating over the microelectronic device;
applying a tamper-resistant coating over the thermal protection coating;
applying a first encapsulation layer around the tamper-resistant coated device;
inducing the first encapsulation layer into gaps in the tamper-resistant coated device; and
electrically connecting the microelectronic device to the substrate before applying the first encapsulation layer.
12. The method of claim 11 wherein, after inducing the first encapsulation layer into gaps, the method further comprises:
applying a second encapsulation layer around the first encapsulation layer, the second encapsulation layer for providing a handling surface and moisture resistance for the microelectronic device.
13. The method of claim 12 wherein inducing the first encapsulation layer into gaps comprises, applying the first encapsulation layer in a vacuum environment.
14. The method of claim 12 wherein inducing the first encapsulation layer into gaps comprises, applying the first encapsulation layer using a pressurized injection process.
15. The method of claim 12 wherein inducing the first encapsulation layer into gaps comprises, degassing the first encapsulation layer in a raised temperature vacuum environment.
16. The method of claim 15 wherein the raised temperature vacuum environment comprises an environment of approximately 90° C. and 24 in. Hg.
17. The method of claim 12 wherein the first encapsulation layer is applied using a first liquid encapsulant having a first viscosity and wherein the second encapsulation layer is applied using a second liquid encapsulant having a second viscosity higher than the first viscosity.
18. The method of claim 12 wherein the first and second encapsulation layers are applied using a molded encapsulation process.