Techniques for providing a multimode ion source
View Patent ↗Techniques for providing a multimode ion source are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation, the apparatus including an ion source having a hot cathode and a high frequency plasma generator, wherein the ion source has multiple modes of operation.
1. An apparatus for ion implantation, the apparatus comprising:
an ion source comprising hot cathode and a high frequency plasma generator, wherein the ion source has multiple modes of operation.
2. The apparatus of claim 1 , wherein the ion source operates in a first mode using the hot cathode, wherein the first mode is a hot mode operation.
3. The apparatus of claim 1 , wherein the ion source operates in a second mode using the high frequency plasma generator, wherein the second mode of operation is a cold mode operation.
4. The apparatus of claim 3 , wherein the high frequency plasma generator comprises at least one of an inductively coupled plasma (ICP) generator, a helicon plasma generator, and a microwave plasma generator.
5. The apparatus of claim 1 , wherein the ion source operates in a third mode of operation using the hot cathode and the high frequency plasma generator.
6. The apparatus of claim 1 , wherein the high frequency plasma generator is coupled to the ion source by at least one plasma pipe.
7. The apparatus of claim 6 , wherein the high frequency plasma generator is remotely controlled.
8. A multi-mode ion source, the ion source comprising:
a chamber;
a hot cathode; and
a high frequency plasma generator;
wherein the ion source has multiple modes of operation.
9. The multi-mode ion source of claim 8 , wherein the ion source operates in a first mode using the hot cathode.
10. The multi-mode ion source of claim 8 , wherein the ion source operates in a second mode using the high frequency plasma generator.
11. The multi-mode ion source of claim 10 , wherein the high frequency plasma generator comprises at least one of an inductively coupled plasma (ICP) generator, a helicon plasma generator, and a microwave plasma generator.
12. A method for generating ions in an ion source, the method comprising:
providing a first mode of operation based on a hot cathode; and
providing a second mode of operation based on a high frequency plasma generator.
13. The method of claim 12 , wherein the high frequency plasma generator comprises at least one of an inductively coupled plasma (ICP) generator, a helicon plasma generator, and a microwave plasma generator.
14. The method of claim 12 , further comprising providing a third mode of operation based on the hot cathode and the high frequency plasma generator.