Color filter of image sensor, image sensor, and method for manufacturing the image sensor
View Patent ↗A color filter of an image sensor, an image sensor and a method for manufacturing the image sensor are disclosed, wherein shapes of respective unit color cells closely form various color patterns, such as a red color pattern, a green color pattern and a blue color pattern, within each unit color cell in a stripe type, and various colors such as red, green and blue required for image generation are produced, without interdependence of the respective unit color cells, are normally realized to induce a finished color filter array to smoothly express more colors, so that the resolution of a generated image in an optimal state is achieved.
1. A method for manufacturing an image sensor comprising:
forming an isolating layer in order to define an active region on a semiconductor substrate;
depositing a first insulating layer and a first conductive layer on the substrate;
patterning the first insulating layer and the first conductive layer to form second and third electrodes to be spaced apart from each other;
depositing a second insulating layer and a second conductive layer in order to fill a space between the second and third electrodes;
patterning the second insulating layer and the second conductive layer to form a first electrode;
forming intermediate layers on the first, second and third electrodes;
forming second and third color patterns spaced apart from each other at a predetermined interval on a predetermined region of a unit color cell on the respective pre-defined intermediate layer; and
forming a first color pattern in order to fill a space between the second and third color patterns.
2. The method according to claim 1 , wherein the first color pattern is one colorizing a light into green.
3. The method according to claim 1 , wherein the first electrode and the second electrode overlap each other.
4. The method according to claim 1 , wherein the first electrode and the third electrode overlap each other.
5. The method according to claim 1 , wherein the first color pattern and the second color pattern overlap each other.
6. A method for manufacturing an image sensor comprising:
forming at least one photosensitive pixel unit disposed on an active region of a semiconductor substrate for selectively sensing and individually outputting photocharges;
forming an intermediate layer for transmitting the different colors of light; and
forming at least one unit color cell for colorizing incident light into different colors,
wherein the one photosensitive pixel unit corresponds to the one unit color cell.
7. The method according to claim 6 , wherein the photosensitive pixel unit comprises:
a potential well temporarily formed on the active region of the semiconductor substrate according to an input bias for receiving light passing through the unit color cell to generate and accumulate the photocharges;
a first electrode disposed on the active region for transmitting the light passing through a first region of the unit color cell to generate the photocharges at the potential well;
a second electrode disposed on the active region for transmitting the light passing through a second region of the unit color cell to generate the photocharges at the potential well; and
a third electrode disposed on the active region for transmitting the light passing through a third region of the unit color cell to generate the photocharges at the potential well.
8. The method according to claim 7 , wherein the second and third electrodes are substantially simultaneously driven, and the first electrode is driven separately from the second and third electrodes.
9. The method according to claim 6 , wherein the unit color cell include color patterns of red, green and blue, and
wherein color patterns of red, green and blue are each formed by occupying a predetermined scale of individual occupation space within the unit color cell.
10. The method according to claim 9 , wherein the color patterns formed within the unit color cell are arranged in rows in a stripe type with interfaces between the color patterns in close contact so the color patterns overlap at the interfaces.
11. A method for manufacturing an image sensor comprising:
forming at least one photosensitive pixel unit disposed on an active region of a semiconductor substrate for selectively sensing and individually outputting photocharges;
forming an intermediate layer for transmitting the different colors of light; and
forming at least one unit color cell for colorizing incident light into different colors,
wherein the one photosensitive pixel unit senses the different colors.
12. The method according to claim 11 , wherein the photosensitive pixel unit comprises:
a potential well temporarily formed on the active region of the semiconductor substrate according to an input bias for receiving light passing through the unit color cell to generate and accumulate the photocharges;
a first electrode disposed on the active region for transmitting the light passing through a first region of the unit color cell to generate the photocharges at the potential well;
a second electrode disposed on the active region for transmitting the light passing through a second region of the unit color cell to generate the photocharges at the potential well; and
a third electrode disposed on the active region for transmitting the light passing through a third region of the unit color cell to generate the photocharges at the potential well.
13. The method according to claim 12 , wherein the second and third electrodes are substantially simultaneously driven, and the first electrode is driven separately from the second and third electrodes.
14. The method according to claim 11 , wherein the unit color cell includes color patterns of red, green, and blue, and
wherein color patterns of red, green, and blue are each formed by occupying a predetermined scale of individual occupation space within the unit color cell.
15. The method according to claim 14 , wherein the color patterns formed within the unit color cell are arranged in rows in a stripe type with interfaces between the color patterns in close contact so the color patterns overlap at the interfaces.