IP Library Granted Patent US 7,821,016
Granted Patent B2
US 7,821,016 · App. 12/061,085 · Granted Oct 26, 2010

Light activated silicon controlled switch

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,821,016
App. No.
12/061,085
Granted
Oct 26, 2010
Kind
B2
Abstract

The present invention provides an optically triggered switch and a method of forming the optically triggered switch. The optically triggered switch includes a silicon layer having at least one trench formed therein and at least one silicon diode formed in the silicon layer. The switch also includes a first thyristor formed in the silicon layer. The first thyristor is physically and electrically isolated from the silicon diode by the trench and the first thyristor is configured to turn on in response to electromagnetic radiation generated by the silicon diode.

Claims (21)

1. An optically triggered switch, comprising:

a silicon layer having at least one trench formed therein;

at least one silicon diode formed in the silicon layer; and

a first thyristor formed in the silicon layer, the first thyristor being physically and electrically isolated from said at least one silicon diode by said at least one trench, and the first thyristor being configured to turn on in response to electromagnetic radiation generated by said at least one silicon diode.

2. The optically triggered switch set forth in claim 1 , wherein the first thyristor comprises:

a first p-type region formed in the silicon layer;

a first n-type region formed within the first p-type region;

a second p-type region formed within the first n-type region; and

at least one second n-type region formed within the second p-type region.

3. The optically triggered switch set forth in claim 2 , wherein the first thyristor comprises:

an anode in contact with the first p-type region; and

a cathode in contact with said at least one second n-type region.

4. The optically triggered switch set forth in claim 3 , comprising a second thyristor including a third n-type region formed within the second p-type region, the third n-type region being formed such that the electromagnetic radiation generated by said at least one silicon diode turns on the second thyristor.

5. The optically triggered switch set forth in claim 4 , comprising:

an amplifying gate comprising a fourth n-type region formed in the second p-type region; and

a third p-type region coupled to the amplifying gate.

6. The optically triggered switch set forth in claim 5 , wherein a first current is generated in the first n-type region and the second p-type region by the electromagnetic radiation, and wherein the first current creates a first voltage drop that forward biases the second thyristor.

7. The optically triggered switch set forth in claim 6 , wherein the second thyristor forms a second current when the second thyristor is turned on.

8. The optically triggered switch set forth in claim 7 , wherein the second current creates a second voltage drop that forward biases the third thyristor.

9. The optically triggered switch set forth in claim 8 , wherein an emitter in the first thyristor injects electrons in response to a forward bias of the emitter.

10. The optically triggered switch set forth in claim 9 , wherein the first thyristor turns on in response to the third current exceeding a latching current of the first thyristor.

Assignments (6)
RELEASE OF SECURITY INTEREST Recorded May 29, 2018
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: MICROSEMI CORPORATION; MICROSEMI SEMICONDUCTOR (U.S.), INC.; MICROSEMI FREQUENCY AND TIME CORPORATION; MICROSEMI COMMUNICATIONS, INC.; MICROSEMI SOC CORP.; MICROSEMI CORP. - POWER PRODUCTS GROUP; MICROSEMI CORP. - RF INTEGRATED SOLUTIONS
Reel/Frame 046251/0391 →
PATENT SECURITY AGREEMENT Recorded Feb 3, 2016
From: MICROSEMI CORPORATION; MICROSEMI SEMICONDUCTOR (U.S.) INC. (F/K/A LEGERITY, INC., ZARLINK SEMICONDUCTOR (V.N.) INC., CENTELLAX, INC., AND ZARLINK SEMICONDUCTOR (U.S.) INC.); MICROSEMI FREQUENCY AND TIME CORPORATION (F/K/A SYMMETRICON, INC.); MICROSEMI COMMUNICATIONS, INC. (F/K/A VITESSE SEMICONDUCTOR CORPORATION); MICROSEMI SOC CORP. (F/K/A ACTEL CORPORATION); MICROSEMI CORP. - POWER PRODUCTS GROUP (F/K/A ADVANCED POWER TECHNOLOGY INC.); MICROSEMI CORP. - RF INTEGRATED SOLUTIONS (F/K/A AML COMMUNICATIONS, INC.)
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037691/0697 →
RELEASE OF SECURITY INTEREST Recorded Jan 19, 2016
From: BANK OF AMERICA, N.A.
To: MICROSEMI CORPORATION; MICROSEMI CORP.-ANALOG MIXED SIGNAL GROUP, A DELAWARE CORPORATION; MICROSEMI SOC CORP., A CALIFORNIA CORPORATION; MICROSEMI SEMICONDUCTOR (U.S.) INC., A DELAWARE CORPORATION; MICROSEMI FREQUENCY AND TIME CORPORATION, A DELAWARE CORPORATION; MICROSEMI COMMUNICATIONS, INC. (F/K/A VITESSE SEMICONDUCTOR CORPORATION), A DELAWARE CORPORATION; MICROSEMI CORP.-MEMORY AND STORAGE SOLUTIONS (F/K/A WHITE ELECTRONIC DESIGNS CORPORATION), AN INDIANA CORPORATION
Reel/Frame 037558/0711 →
NOTICE OF SUCCESSION OF AGENCY Recorded Apr 9, 2015
From: ROYAL BANK OF CANADA (AS SUCCESSOR TO MORGAN STANLEY & CO. LLC)
To: BANK OF AMERICA, N.A., AS SUCCESSOR AGENT
Reel/Frame 035657/0223 →
PATENT SECURITY AGREEMENT Recorded Nov 26, 2013
From: MICROSEMI SEMICONDUCTOR (U.S.) INC.
To: MORGAN STANLEY & CO. LLC
Reel/Frame 031729/0667 →
CHANGE OF NAME Recorded Nov 18, 2013
From: ZARLINK SEMICONDUCTOR (U.S.) INC.
To: MICROSEMI SEMICONDUCTOR (U.S.) INC.
Reel/Frame 031746/0214 →