Method for analyzing minute amounts of Pd, Rh and Ru, and high frequency plasma mass spectroscope used for same
View Patent ↗The invention provides a method for analyzing minute amounts of Pd, Rh and Ru with high accuracy by a high-frequency plasma mass spectroscope. The method comprises (1) a step of pretreating a sample by an alkali fusion method using a sodium compound; and (2) a step of analyzing the pretreated sample using a high-frequency plasma mass spectroscope; wherein, in step (2), the distance between a sampling cone and a skimmer cone is adjusted such that the concentration of 40 Ar 65 Cu which interferes with Pd, the concentrations of 40 Ar 63 Cu and 40 Ar 40 Ar 23 Na which interfere with Rh, and the concentrations of 38 Ar 63 Cu and 40 Ar 38 Ar 23 Na which interfere with Ru are all equal to or less than 0.05 ppb.
1. A method for analyzing minute amounts of Pd, Rh and Ru as target elements comprising:
(1) a step of pretreating a sample by an alkali fusion method using a sodium compound; and
(2) a step of analyzing the pretreated sample using a high-frequency plasma mass spectroscope;
wherein, in step (2), the distance between a sampling cone and a skimmer cone is adjusted such that the concentration of 40 Ar 65 Cu which interferes with Pd, the concentrations of 40 Ar 63 Cu and 40 Ar 40 Ar 23 Na which interfere with Rh, and the concentrations of 38 Ar 63 Cu and 40 Ar 38 Ar 23 Na which interfere with Ru are all equal to or less than 0.05 ppb.
2. The method according to claim 1 , wherein the concentration of each target element in the sample is equal to or less than 100 mass ppm.
3. The method according to claim 2 , wherein the concentration of each target element contained in the sample is equal to or less than 1 mass ppm.
4. The method according to any one of claims 1 - 3 , wherein Cu concentration in the sample is 0 to 80 mass %.
5. The method according to claim 1 , wherein Na concentration in the pretreated sample is 500 to 5000 mass ppm.
6. The method according to claim 1 , wherein the distance between the sampling cone and the skimmer cone is 3 to 7 mm.
7. The method according to claim 1 , wherein the high-frequency plasma mass spectroscope is equipped with a means for changing the distance between the sampling cone and the skimmer cone.
8. The method according to claim 1 , wherein the high-frequency plasma mass spectroscope is an ICP mass spectroscope.
9. A high-frequency plasma mass spectroscope for use in the method according to claim 1 , comprising a means for changing the distance between the sampling cone and the skimmer cone.
10. The high-frequency plasma mass spectroscope according to claim 9 , wherein the means for changing the distance between the sampling cone and the skimmer cone is a metallic spacer arranged between the sampling cone and the skimmer cone.
11. The high-frequency plasma mass spectroscope according to claim 9 or 10 , wherein the distance between the sampling cone and the skimmer cone is 3 to 7 mm.
12. The high-frequency plasma mass spectroscope according to claim 9 , wherein the high-frequency plasma mass spectroscope is an ICP mass spectroscope.