Semiconductor device
View Patent ↗An open portion is provided to an interlayer insulation film so as to correspond to a photoreceptor part of an optical detection device. A partition wall for surrounding the open portion ( 120 ) is formed by a metal material inside a wiring structure layer ( 90 ) along the boundary between the photoreceptor part ( 4 ) and a circuit part ( 6 ). The partition wall is formed by a contact structure having a multi-level structure with respect to a separation region ( 74 ) disposed on the external periphery of the photoreceptor part ( 4 ). The partition wall prevents moisture absorption and light penetration from the wall surface of the open portion, and suppresses wiring degradation or fluctuation of the characteristics of the circuit elements on the periphery of the photoreceptor part.
1. A semiconductor device in which a photoreceptor part and a circuit part are arranged adjacent to each other on a shared semiconductor substrate, the semiconductor device comprising:
an electrode region that is a diffusion layer region formed in a surface of the semiconductor substrate at the photoreceptor part, and that gathers signal charges generated by light incident on the photoreceptor part;
a wiring structure layer that is layered over the semiconductor substrate, and that includes an interlayer insulation film;
an open portion of the wiring structure layer, formed in a position of the photoreceptor part; and
a partition wall composed of a metal material that is formed within the wiring structure layer adjacent to the open portion, along a boundary of the photoreceptor portion with the circuit portion, wherein
the electrode region has an extended portion that extends farther to an outside than the boundary,
the wiring structure layer has a first wiring which is separate from the partition wall and via which the signal charges are read from the electrode region to the circuit portion, and
the first wiring is electrically connected with the electrode region at the extended portion.
2. The semiconductor device according to claim 1 , wherein the partition wall is formed so as to surround the open portion.
3. The semiconductor device according to claim 1 , further comprising:
a second wiring formed in the wiring structure layer;
a trench portion formed in a band shape along the boundary in the interlayer insulation film so as to pass through the interlayer insulation film;
a plug portion composed of a metal material embedded in the trench portion; and
a separation region that is a diffusion layer region formed along an external periphery of the photoreceptor part on a surface of the semiconductor substrate; wherein
the partition wall is formed by a contact structure that includes the plug portion and electrically connects the second wiring with the separation region, and the separation region is set to a potential that corresponds to a power supply that is connected to the second wiring.
4. The semiconductor device according to claim 3 , wherein
the wiring structure layer is a multilayer wiring structure that includes a plurality of layers of the interlayer insulation film;
the contact structure is formed by superposing the plug portions each of which is formed in the interlayer insulation films; and
at least some of the levels among a plurality of levels of the plug portions are formed continuously with an entire periphery of the open portion.